Patents by Inventor Haojiang Chen

Haojiang Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate cleaning apparatus and method
    Patent number: 6692903
    Abstract: A method of processing a substrate 30 comprises exposing the substrate 30 to an energized process gas to etch features 67 on the substrate 30 and exposing the substrate 30 to an energized cleaning gas to remove etchant residue 70 and/or remnant resist 60 from the substrate 30. To enhance the cleaning process, the substrate 30 may be treated before, during or after the cleaning process by exposing the substrate 30 to an energized treating gas comprising a halogen species.
    Type: Grant
    Filed: December 13, 2000
    Date of Patent: February 17, 2004
    Assignee: Applied Materials, Inc
    Inventors: Haojiang Chen, James S. Papanu, Mark Kawaguchi, Harald Herchen, Jeng H. Hwang, Guangxiang Jin, David Palagashvili
  • Substrate cleaning apparatus and method
    Publication number: 20020072016
    Abstract: A method of processing a substrate 30 comprises exposing the substrate 30 to an energized process gas to etch features 67 on the substrate 30 and exposing the substrate 30 to an energized cleaning gas to remove etchant residue 70 and/or remnant resist 60 from the substrate 30. To enhance the cleaning process, the substrate 30 may be treated before, during or after the cleaning process by exposing the substrate 30 to an energized treating gas comprising a halogen species.
    Type: Application
    Filed: December 13, 2000
    Publication date: June 13, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Haojiang Chen, James S. Papanu, Mark Kawaguchi, Harald Herchen, Jeng H. Hwang, Guangxiang Jin, David Palagashvili