Patents by Inventor Haoshu ZHU

Haoshu ZHU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240069426
    Abstract: A projection curtain is provided in the present invention. The projection curtain at least comprises a reflective layer and one of a colored layer, a diffusion layer, and a Fresnel lens layer. The Fresnel lens layer is a spherical Fresnel lens layer or an aspherical Fresnel lens layer. The Fresnel lens layer comprises a plurality of annular protrusions protruding from a plane, the plurality of annular protrusions are arranged in circular bands. A cross-sectional shape of each annular protrusion along a cross section perpendicular to the plane is a triangular shape or a multi-step shape or a free surface shape. The width of one side of each cross-sectional shape parallel to the plane gradually changes, and gradual change of the cross-sectional shape and the width thereof determines light gathering characteristics of the spherical Fresnel lens layer or the aspherical Fresnel lens layer. A surface of each annular protrusion has scattered microstructures.
    Type: Application
    Filed: January 18, 2022
    Publication date: February 29, 2024
    Applicants: IVTECH JIANGSU CO., LTD., IVTOUCH CO., LTD., SVG TECH GROUP CO., LTD.
    Inventors: Xiaohong ZHOU, Ming ZHU, Donglin PU, Pengfei ZHU, Haoshu ZHU, Rubin SUN, Linsen Chen
  • Publication number: 20230213869
    Abstract: A preparation method (100) for a three-dimensional micro-nano morphological structure manufactured by a laser direct writing lithography machine, comprising: step 110, providing a three-dimensional model diagram; step 120, dividing the three-dimensional model diagram in a height direction to obtain at least one height interval; and step 130, projecting the three-dimensional model diagram onto a plane to obtain a mapping relationship, wherein the mapping relationship comprises coordinates, on the plane, corresponding to each point on the three-dimensional model diagram, and wherein the height of each point on the three-dimensional model diagram corresponds to a height value in a corresponding height interval; and making the mapping relationship correspond to an exposure dose according to the mapping relationship, and performing lithography on the basis of the exposure dose. Any three-dimensional micro-nano morphological structure can be obtained.
    Type: Application
    Filed: January 19, 2022
    Publication date: July 6, 2023
    Inventors: Linsen CHEN, Donglin PU, Jin ZHANG, Ming ZHU, Pengfei ZHU, Wen QIAO, Haoshu ZHU, Xiaoning LIU, Renjin SHAO, Ying YANG