Patents by Inventor Hao-Xuan Zheng

Hao-Xuan Zheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220334167
    Abstract: A method for detecting defects in a GaN high electron mobility transistor is disclosed. The method includes steps of measuring a plurality of electrical characteristics of a GaN high electron mobility transistor, measuring the plurality of electrical characteristics after performing a deterioration test on the GaN high electron mobility transistor, irradiating the GaN high electron mobility transistor in turns with a plurality of light sources with different wavelengths and measuring the plurality of electrical characteristics after each irradiation of the GaN high electron mobility transistor by each of the plurality of light sources, and comparing changes of the plurality of electrical characteristics measured in the above steps to determine the defect location of the GaN high electron mobility transistor.
    Type: Application
    Filed: June 10, 2021
    Publication date: October 20, 2022
    Inventors: Ting-Chang CHANG, Hao-Xuan ZHENG, Yu-Shan LIN, Fu-Yuan JIN, Fong-Min CIOU, Mao-Chou TAI, Yun-Hsuan LIN, Wei-Chen HUANG, Wen-Chung CHEN
  • Publication number: 20220157978
    Abstract: A p-GaN high electron mobility transistor is disclosed. The p-GaN high electron mobility transistor includes a substrate, a channel layer located on the substrate, a supply layer laminated on the channel layer, and a doped layer laminated on the supply layer. A doping concentration of the doped layer is gradually distributed, in which the doping concentration in a first doped region close to the supply layer is lower than a doping concentration in a second doped region distant from the supply layer. A gate electrode is located on the doped layer. A source electrode and a drain electrode are respectively electrically connected to the channel layer and the supply layer.
    Type: Application
    Filed: November 26, 2020
    Publication date: May 19, 2022
    Inventors: Ting-Chang Chang, Hong-Chih Chen, Hao-Xuan Zheng, Yu-Shan Lin, Fu-Yuan Jin, Fong-Min Ciou, Yun-Hsuan Lin, Mao-Chou Tai, Wen-Chung Chen
  • Publication number: 20220123136
    Abstract: A GaN high electron mobility transistor is disclosed. The GaN high electron mobility transistor includes a substrate, a buffer layer located on the substrate, a barrier layer laminated on the buffer layer, a channel layer laminated on the barrier layer, a supply layer laminated on the channel layer. The barrier layer has either a p-type semiconductor or a wide band gap material. A gate electrode is located on the supply layer. A source electrode and a drain electrode are electrically connected to the channel layer and the supply layer.
    Type: Application
    Filed: March 15, 2021
    Publication date: April 21, 2022
    Inventors: Ting-Chang Chang, Hong-Chih Chen, Hao-Xuan Zheng, Yu-Shan Lin, Fu-Yuan Jin, Fong-Min Ciou, Yun-Hsuan Lin, Mao-Chou Tai, Wen-Chung Chen