Patents by Inventor HARALD KOESTENBAUER

HARALD KOESTENBAUER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11862444
    Abstract: An electrically conductive, oxidic target material includes a proportion of substoichiometric molybdenum oxide phases of at least 60% by volume, an MoO2 phase in a proportion of 2-20% by volume, and optionally an MoO3 phase in a proportion of 0-20% by volume. The substoichiometric molybdenum oxide phase proportion is formed by one or more substoichiometric MoO3-y phase(s), where y is in each case in a range from 0.05 to 0.25. A process for producing the target material and a process for using the target material are also provided.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: January 2, 2024
    Assignee: Plansee SE
    Inventors: Enrico Franzke, Harald Koestenbauer, Joerg Winkler, Dominik Lorenz, Thomas Leiter
  • Patent number: 11047038
    Abstract: A metallization for a thin-film component includes at least one layer composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a metallization includes providing at least one sputtering target, depositing at least one layer of an Mo-based alloy containing Al and Ti and usual impurities, and structuring the metallization by using at least one photolithographic process and at least one subsequent etching step. A sputtering target is composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a sputtering target composed of an Mo-based alloy includes providing a powder mixture containing Mo and also Al and Ti and cold gas spraying (CGS) of the powder mixture onto a suitable support material.
    Type: Grant
    Filed: August 10, 2015
    Date of Patent: June 29, 2021
    Assignee: Plansee SE
    Inventors: Harald Koestenbauer, Judith Koestenbauer, Gerhard Leichtfried, Joerg Winkler, Moo Sung Hwang, Martin Kathrein, Elisabeth Eidenberger
  • Publication number: 20200255341
    Abstract: An electrically conductive, oxidic target material includes a proportion of substoichiometric molybdenum oxide phases of at least 60% by volume, an MoO2 phase in a proportion of 2-20% by volume, and optionally an MoO3 phase in a proportion of 0-20% by volume. The substoichiometric molybdenum oxide phase proportion is formed by one or more substoichiometric MoO3-y phase(s), where y is in each case in a range from 0.05 to 0.25. A process for producing the target material and a process for using the target material are also provided.
    Type: Application
    Filed: September 5, 2018
    Publication date: August 13, 2020
    Inventors: Enrico FRANZKE, Harald KÖSTENBAUER, Jörg WINKLER, Dominik LORENZ, Thomas LEITER
  • Publication number: 20170260622
    Abstract: A metallization for a thin-film component includes at least one layer composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a metallization includes providing at least one sputtering target, depositing at least one layer of an Mo-based alloy containing Al and Ti and usual impurities, and structuring the metallization by using at least one photolithographic process and at least one subsequent etching step. A sputtering target is composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a sputtering target composed of an Mo-based alloy includes providing a powder mixture containing Mo and also Al and Ti and cold gas spraying (CGS) of the powder mixture onto a suitable support material.
    Type: Application
    Filed: August 10, 2015
    Publication date: September 14, 2017
    Inventors: HARALD KOESTENBAUER, JUDITH KOESTENBAUER, GERHARD LEICHTFRIED, JOERG WINKLER, MOO SUNG HWANG, MARTIN KATHREIN, ELISABETH EIDENBERGER