Patents by Inventor Harald Petrus Cornelis Vos

Harald Petrus Cornelis Vos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dedicated metrology stage for lithography applications
    Patent number: 8547522
    Abstract: A system and method are used to detect parameters regarding an exposure portion or an exposure beam. The system comprising a substrate stage and a metrology stage. The substrate stage is configured to position a substrate to receive an exposure beam from an exposure portion of a lithography system. The metrology stage has a sensor system thereon that is configured to detected parameters of the exposure system or the exposure beam. In one example, the system is within a lithography system, which further comprises an illumination system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the illumination system. The projection system, which is located within the exposure portion, projects that pattered beam onto the substrate or the sensor system.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: October 1, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, Harald Petrus Cornelis Vos
  • Dedicated Metrology Stage for Lithography Applications
    Publication number: 20100149507
    Abstract: A system and method are used to detect parameters regarding an exposure portion or an exposure beam. The system comprising a substrate stage and a metrology stage. The substrate stage is configured to position a substrate to receive an exposure beam from an exposure portion of a lithography system. The metrology stage has a sensor system thereon that is configured to detected parameters of the exposure system or the exposure beam. In one example, the system is within a lithography system, which further comprises an illumination system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the illumination system. The projection system, which is located within the exposure portion, projects that pattered beam onto the substrate or the sensor system.
    Type: Application
    Filed: December 9, 2009
    Publication date: June 17, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Marcus Adrianus VAN DE KERKHOF, Harald Petrus Cornelis Vos