Patents by Inventor Harald Schink

Harald Schink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Monocrystalline optical component with curved surface and multilayer coating
    Patent number: 7489441
    Abstract: An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength ?0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.
    Type: Grant
    Filed: May 17, 2005
    Date of Patent: February 10, 2009
    Assignee: Carl Zeiss SMT AG
    Inventors: Guenter Scheible, legal representative, Sigrid Scheible, legal representative, Harald Schink, Alexander Hirnet, Patrick Scheible
  • PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY
    Publication number: 20080297745
    Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
    Type: Application
    Filed: August 6, 2008
    Publication date: December 4, 2008
    Inventors: Karl-Stefan WEISSENRIEDER, Alexander HIRNET, Alexander PAZIDIS, Karl-Heinz SCHUSTER, Christoph ZACZEK, Michael LILL, Patrick SCHEIBLE, Guenter SCHEIBLE, Sigrid SCHEIBLE, Harald SCHINK, Markus BROTSACK, Ulrich LOERING, Toralf GRUNER
  • Projection objective for immersion lithography
    Patent number: 7460206
    Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: December 2, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Guenter Scheible, legal representative, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Patrick Scheible
  • PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY
    Publication number: 20080291419
    Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
    Type: Application
    Filed: August 6, 2008
    Publication date: November 27, 2008
    Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Patrick Scheible, Guenter Scheible, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Sigrid Scheible
  • Optical component with a curved surface and a multilayer coating
    Publication number: 20050286827
    Abstract: An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength ?0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.
    Type: Application
    Filed: May 17, 2005
    Publication date: December 29, 2005
    Inventors: Patrick Scheible, Guenter Scheible, Sigrid Scheible, Harald Schink, Alexander Hirnet
  • Projection objective for immersion lithography
    Publication number: 20050225737
    Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
    Type: Application
    Filed: December 20, 2004
    Publication date: October 13, 2005
    Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Patrick Scheible, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Guenter Scheible