Abstract: A dishwasher (1), in particular a commercial dishwasher (1), which is in the form of a box-type dishwasher and has a treatment chamber (2) which can be closed and in which washware can be treated in accordance with a predefined or predefinable treatment program, wherein a washware detector apparatus (51) is designed to detect the type of washware to be, wherein the washware detector apparatus (51) has an optical identification system, which is oriented toward the washware to be treated, and an evaluation device, wherein the optical identification system is designed to record at least a portion of the light reflected by the washware to be treated as a reflection image, and wherein the evaluation device is designed to automatically distinguish between different types of washware on the basis of the recorded reflection image, wherein the extent of the reflection provides information about the type of washware.

Abstract: Various embodiments provide a method of reducing a sheet resistance in an electronic device encapsulated at least partially in an encapsulation material, wherein the method comprises: providing an electronic device comprising a multilayer structure and being at least partially encapsulated by an encapsulation material; and locally introducing energy into the multilayer structure for reducing a sheet resistance.

Abstract: Various embodiments provide a method of reducing a sheet resistance in an electronic device encapsulated at least partially in an encapsulation material, wherein the method comprises: providing an electronic device comprising a multilayer structure and being at least partially encapsulated by an encapsulation material; and locally introducing energy into the multilayer structure for reducing a sheet resistance.

Abstract: In various embodiments, a method of processing a semiconductor device may include providing a semiconductor device comprising a contact pad and a polymer layer; and subjecting at least a part of the contact pad and the polymer layer to a plasma comprising ammonia.

Abstract: Various embodiments provide a method of reducing a sheet resistance in an electronic device encapsulated at least partially in an encapsulation material, wherein the method comprises: providing an electronic device comprising a multilayer structure and being at least partially encapsulated by an encapsulation material; and locally introducing energy into the multilayer structure for reducing a sheet resistance.

Abstract: In various embodiments, a method of processing a semiconductor device may include providing a semiconductor device comprising a contact pad and a polymer layer; and subjecting at least a part of the contact pad and the polymer layer to a plasma comprising ammonia.