Patents by Inventor Hari S. Hegde

Hari S. Hegde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electromagnetic field generator and method of operation
    Patent number: 6545580
    Abstract: An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.
    Type: Grant
    Filed: September 9, 1998
    Date of Patent: April 8, 2003
    Assignee: VEECO Instruments, Inc.
    Inventors: Hari S. Hegde, Mihai S. Risca, Alan V. Hayes, Abraham J. Navy, Roger P. Fremgen
  • ELECTROMAGNETIC FIELD GENERATOR AND METHOD OF OPERATION
    Publication number: 20020047767
    Abstract: An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.
    Type: Application
    Filed: September 9, 1998
    Publication date: April 25, 2002
    Inventors: HARI S. HEGDE, MIHAI S. RISCA, ALAN V. HAYES, ABRAHAM J. NAVY, ROGER P. FREMGEN