Patents by Inventor Harlan D. Stamper

Harlan D. Stamper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a dual damascene structure utilizing a developable anti-reflective coating
    Patent number: 7432191
    Abstract: A method of patterning a structure in a thin film on a substrate is described. A film stack on the substrate includes the thin film on the substrate, a developable anti-reflective coating (ARC) layer on the thin film, and a first photo-resist layer on the developable ARC layer. The first photo-resist layer and the developable ARC layer are imaged with a first image pattern and developed to form the first image pattern in the first photo-resist layer and the developable ARC layer. Thereafter, the first photo-resist layer is removed, and the developable ARC layer is modified by thermal treatment. A second photo-resist layer is then formed on the modified ARC layer, and the second photo-resist layer is imaged with a second image pattern and developed to form the second image pattern in the second photo-resist layer. The first and second image patterns are then transferred to the thin film.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: October 7, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Harlan D. Stamper, Shannon W. Dunn, Sandra Hyland