Patents by Inventor Harlan L. Halsey

Harlan L. Halsey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Automated substrate processing systems and methods
    Patent number: 6257045
    Abstract: Automated systems and methods for processing substrates are described. An automated processing system includes: a vacuum chamber; a substrate support located inside the vacuum chamber and constructed and arranged to support a substrate during processing; and a substrate alignment detector constructed and arranged to detect if the substrate is misaligned as the substrate is transferred into the vacuum chamber based upon a change in a physical condition inside the system. The substrate alignment detector may include a vibration detector coupled to the substrate support. A substrate may be transferred into the vacuum chamber. The position of the substrate may be recorded as it is being transferred into the vacuum chamber. Misalignment of the substrate with respect to the substrate support may be detected. The substrate may be processed. The processed substrate may be unloaded from the vacuum chamber. The position of the processed substrate may be recorded as it is being unloaded from the vacuum chamber.
    Type: Grant
    Filed: September 8, 1999
    Date of Patent: July 10, 2001
    Assignee: Applied Komatsu Technology, Inc.
    Inventors: Akihiro Hosokawa, Richard Ernest Demaray, Makoto Inagawa, Ravi Mullapudi, Harlan L. Halsey, Michael T. Starr
  • Automated substrate processing systems and methods
    Patent number: 6205870
    Abstract: Automated systems and methods for processing substrates are described. An automated processing system includes: a vacuum chamber; a substrate support located inside the vacuum chamber and constructed and arranged to support a substrate during processing; and a substrate alignment detector constructed and arranged to detect if the substrate is misaligned as the substrate is transferred into the vacuum chamber based upon a change in a physical condition inside the system. The substrate alignment detector may include a vibration detector coupled to the substrate support. A substrate may be transferred into the vacuum chamber. The position of the substrate may be recorded as it is being transferred into the vacuum chamber. Misalignment of the substrate with respect to the substrate support may be detected. The substrate may be processed. The processed substrate may be unloaded from the vacuum chamber. The position of the processed substrate may be recorded as it is being unloaded from the vacuum chamber.
    Type: Grant
    Filed: October 10, 1997
    Date of Patent: March 27, 2001
    Assignee: Applied Komatsu Technology, Inc.
    Inventors: Akihiro Hosokawa, Richard Ernest Demaray, Makoto Inagawa, Ravi Mullapudi, Harlan L. Halsey, Michael T. Starr