Patents by Inventor Harm Hubertus Joseph Elizabeth KICKEN

Harm Hubertus Joseph Elizabeth KICKEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for determining adjustments to sensitivity parameters
    Patent number: 10520830
    Abstract: A method is described herein including applying, by a metrology apparatus, an incident radiation beam to a substrate including first features on a first layer and second features on a second layer, a relationship between the first and second features being characterized by a parameter of interest having a first value, wherein the metrology apparatus is operated in accordance with at least one characteristic having a first setting; receiving intensity data representing intensity of a portion of the incident radiation beam scattered by the first and second features; determining, based on the intensity data, a second value of the parameter of interest; and applying one or more adjustments to the at least one characteristic such that the at least one characteristic has a second setting different from the first, the one or more adjustments being determined based on a difference between the first value and the second value.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: December 31, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Harm Hubertus Joseph Elizabeth Kicken, Martijn Maria Zaal
  • METHOD AND DEVICE FOR DETERMINING ADJUSTMENTS TO SENSITIVITY PARAMETERS
    Publication number: 20190204755
    Abstract: A method is described herein including applying, by a metrology apparatus, an incident radiation beam to a substrate including first features on a first layer and second features on a second layer, a relationship between the first and second features being characterized by a parameter of interest having a first value, wherein the metrology apparatus is operated in accordance with at least one characteristic having a first setting; receiving intensity data representing intensity of a portion of the incident radiation beam scattered by the first and second features; determining, based on the intensity data, a second value of the parameter of interest; and applying one or more adjustments to the at least one characteristic such that the at least one characteristic has a second setting different from the first, the one or more adjustments being determined based on a difference between the first value and the second value.
    Type: Application
    Filed: December 14, 2018
    Publication date: July 4, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Harm Hubertus Joseph Elizabeth KICKEN, Martijn Maria ZAAL