Patents by Inventor Harm Roelof Rossing

Harm Roelof Rossing has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 7046331
    Abstract: A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a respective one of the substrate holders. A controller ensures that either the substrate is processed on the appropriate holder or that correction is applied to the imaging. In an alternate embodiment, the substrate is associated with a respective one of the substrate holders and is consistently processed using that substrate holder without further identification steps.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: May 16, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Harm Roelof Rossing, Marinus Aart Van Den Brink, Richard Alexander George
  • Method, computer program product and apparatus for scheduling maintenance actions in a substrate processing system
    Patent number: 6879866
    Abstract: A method of scheduling one or more maintenance actions in at least a part of a substrate processing system is provided. According to an embodiment, the method includes determining a gap in the flow of substrates in a part of the substrate processing system and scheduling one or more maintenance actions to be performed in another part of the substrate processing during a period associated with the gap. An increase of productivity of substrate processing can be achieved through a reduction in downtime in a substrate processing system by appropriate scheduling of maintenance actions.
    Type: Grant
    Filed: August 4, 2003
    Date of Patent: April 12, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbe Tel, Harm Roelof Rossing, Suzan Leonie Auer-Jongepier
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20030211297
    Abstract: A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a respective one of the substrate holders. A controller ensures that either the substrate is processed on the appropriate holder or that correction is applied to the imaging. In an alternate embodiment, the substrate is associated with a respective one of the substrate holders and is consistently processed using that substrate holder without further identification steps.
    Type: Application
    Filed: April 7, 2003
    Publication date: November 13, 2003
    Applicant: ASML NETHERLANDS, B.V.
    Inventors: Harm Roelof Rossing, Marinus Aart Van Den Brink, Richard Alexander George