Patents by Inventor Harmut Rudmann

Harmut Rudmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Replication and related methods and devices, in particular for minimizing asymmetric form errors
    Patent number: 11554563
    Abstract: The method regards manufacturing devices by replication, wherein each of the devices comprises a device surface. The method comprises producing the devices from a replication material by replication using a replication tool (1), wherein the replication tool (1) comprises a tool material comprising replication sites (4) comprising a replication surface (5) each. Each of the replication surfaces (5) corresponds to a negative of the device surface of a respective one of the devices. The tool material comprises, in addition to the replication sites, one or more mitigating features (7) for reducing asymmetric form errors of the device surfaces. Replication tools (1) and methods for manufacturing these are also described.
    Type: Grant
    Filed: July 17, 2018
    Date of Patent: January 17, 2023
    Assignee: Heptagon Micro Optics Pte. Ltd.
    Inventors: QiChuan Yu, Han Nee Ng, Tobias Senn, John A. Vidallon, Ramon Opeda, Attilio Ferrari, Harmut Rudmann, Martin Schubert
  • IMPROVEMENTS IN REPLICATION AND RELATED METHODS AND DEVICES, IN PARTICULAR FOR MINIMIZING ASYMMETRIC FORM ERRORS
    Publication number: 20200353707
    Abstract: The method regards manufacturing devices by replication, wherein each of the devices comprises a device surface. The method comprises producing the devices from a replication material by replication using a replication tool (1), wherein the replication tool (1) comprises a tool material comprising replication sites (4) comprising a replication surface (5) each. Each of the replication surfaces (5) corresponds to a negative of the device surface of a respective one of the devices. The tool material comprises, in addition to the replication sites, one or more mitigating features (7) for reducing asymmetric form errors of the device surfaces. Replication tools (1) and methods for manufacturing these are also described.
    Type: Application
    Filed: July 17, 2018
    Publication date: November 12, 2020
    Inventors: QiChuan Yu, Han Nee Ng, Tobias Senn, John A. Vidallon, Ramon Opeda, Attilio Ferrari, Harmut Rudmann, Martin Schubert
  • Manufacturing optical elements
    Patent number: 7704418
    Abstract: An optical element is manufactured using a replication tool comprising a negative structural feature defined in a replication side of the replication tool, and a peripheral feature formed in the replication side of the replication tool adjacent the negative structural feature. The negative structural feature defines the shape of the optical element. A replication material is disposed between a substrate and the replication tool, which are moved toward each other. The peripheral feature confines the replication material to a predetermined area of the substrate. The replication material can be hardened to form the optical element from the replication material attached to the substrate.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: April 27, 2010
    Assignee: Heptagon Oy
    Inventors: Harmut Rudmann, Stephan Heimgartner, Susanne Westenhöfer, Markus Rossi