Abstract: A controlled diffusion environment capsule system (10) is used with a conventional tubular high temperature furnace (12) as employed in semiconductor manufacturing. The system (10) includes a cantilever boat loading apparatus (14) and a quartz diffusion capsule (16). Wafer carriers (20) support semiconductor wafers (22) concentrically with capsule (16) in closely spaced relationship for processing in the furnace (12). The diffusion capsule (16) is supported on a pair of quartz rods (24). A quartz injector tube (28) extends the length of the diffusion capsule (16). The injector tube (28) has three rows of high aspect-ratio apertures (30) extending along its length to disperse nitrogen or other inert gas uniformly across the sufaces (32) of the wafers (22).

Abstract: A system and method for loading and unloading articles, especially adapted for moving semiconductor wafers into and out of a diffusion chamber. An article support is cantilevered for moving the articles into the chamber without touching it. A separately controllable cantilvered enclosure is provided for movement over the supported wafers when necessary for protection during the loading and/or unloading procedure. An inert gas controllably flows into the enclosure to provide a controlled atmosphere for the wafers during the loading and/or unloading procedure.