Abstract: Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.

Abstract: Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.

Abstract: Various computer-implemented methods are provided. One computer-implemented method for generating input for a simulation program includes combining information about a defect detected on a partially fabricated reticle with information about phase assigned to an area of the reticle proximate to the defect. The phase is to be added to the reticle on a level other than a level on which the defect is formed. The defect is detected on the reticle prior to addition of the phase to the reticle. Another computer-implemented method includes generating a simulated image of a defect on a reticle using information about the defect generated by inspection of one level of the reticle in combination with information about a different level on the reticle.