Patents by Inventor Harold P. Hjalmarson

Harold P. Hjalmarson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6504859
    Abstract: The present invention provides a new type of semiconductor light source that can produce a high peak power output and is not injection, e-beam, or optically pumped. The present invention is capable of producing high quality coherent or incoherent optical emission. The present invention is based on current filaments, unlike conventional semiconductor lasers that are based on p-n junctions. The present invention provides a light source formed by an electron-hole plasma inside a current filament. The electron-hole plasma can be several hundred microns in diameter and several centimeters long. A current filament can be initiated optically or with an e-beam, but can be pumped electrically across a large insulating region. A current filament can be produced in high gain photoconductive semiconductor switches. The light source provided by the present invention has a potentially large volume and therefore a potentially large energy per pulse or peak power available from a single (coherent) semiconductor laser.
    Type: Grant
    Filed: January 21, 2000
    Date of Patent: January 7, 2003
    Assignee: Sandia Corporation
    Inventors: Fred J. Zutavern, Guillermo M. Loubriel, Malcolm T. Buttram, Alan Mar, Wesley D. Helgeson, Martin W. O'Malley, Harold P. Hjalmarson, Albert G. Baca, Weng W. Chow, G. Allen Vawter
  • Patent number: 6248992
    Abstract: A photoconductive semiconductor switch with tailored doping profile zones beneath and extending laterally from the electrical contacts to the device. The zones are of sufficient depth and lateral extent to isolate the contacts from damage caused by the high current filaments that are created in the device when it is turned on. The zones may be formed by etching depressions into the substrate, then conducting epitaxial regrowth in the depressions with material of the desired doping profile. They may be formed by surface epitaxy. They may also be formed by deep diffusion processes. The zones act to reduce the energy density at the contacts by suppressing collective impact ionization and formation of filaments near the contact and by reducing current intensity at the contact through enhanced current spreading within the zones.
    Type: Grant
    Filed: June 18, 1999
    Date of Patent: June 19, 2001
    Assignee: Sandia Corporation
    Inventors: Albert G. Baca, Guillermo M. Loubriel, Alan Mar, Fred J Zutavern, Harold P. Hjalmarson, Andrew A. Allerman, Thomas E. Zipperian, Martin W. O'Malley, Wesley D. Helgeson, Gary J. Denison, Darwin J. Brown, Charles T. Sullivan, Hong Q. Hou