Patents by Inventor Harqkyun Kim

Harqkyun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution
    Patent number: 7871490
    Abstract: An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. Each element is feed by a feeder coil.
    Type: Grant
    Filed: January 24, 2006
    Date of Patent: January 18, 2011
    Assignee: Top Engineering Co., Ltd.
    Inventors: Harqkyun Kim, Yunju Ra
  • Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution
    Publication number: 20060124059
    Abstract: An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. Each element is feed by a feeder coil.
    Type: Application
    Filed: January 24, 2006
    Publication date: June 15, 2006
    Inventors: Harqkyun Kim, Yunju Ra
  • Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes
    Publication number: 20040182319
    Abstract: An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals.
    Type: Application
    Filed: March 18, 2003
    Publication date: September 23, 2004
    Inventors: Harqkyun Kim, Yunju Ra