Patents by Inventor Harry Borggreve

Harry Borggreve has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230171869
    Abstract: A droplet generator nozzle (800, 820/830) includes a metal body (802, 822), a metal fitting (812, 823/833) arranged adjacent to the metal body, and a capillary (804, 824/834) comprising a first end and a second end. The first end of the capillary is disposed within the metal fitting, and the capillary is configured to eject initial droplets of a material from the second end of the capillary. The droplet generator nozzle further includes an electromechanical element (808 828/838) disposed within the metal body and coupled to the first end of the capillary and a fastener element (810) configured to clamp around a portion of the metal body and around the metal fitting. The electromechanical element is configured to apply a change that affects droplet generation from the capillary. The second end of the capillary protrudes out from an opening in the fastener element of the droplet generator nozzle. Droplet generator nozzle 830 of FIG. 8C represents the embodiment shown in FIG.
    Type: Application
    Filed: April 26, 2021
    Publication date: June 1, 2023
    Inventors: Benjamin Andrew Sams, Dietmar Uwe Herbert Trees, Theodorus Wilhelmus Driessen, Herman Harry Borggreve, Brandon Michael Johnson, Vikas Giridhar Telkar
  • Publication number: 20050068511
    Abstract: A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.
    Type: Application
    Filed: November 23, 2004
    Publication date: March 31, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Paulus Liebregts, Arno Bleeker, Erik Loopstra, Harry Borggreve
  • Patent number: 6870601
    Abstract: A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.
    Type: Grant
    Filed: June 10, 2003
    Date of Patent: March 22, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Paulus Martinus Maria Liebregts, Arno Jan Bleeker, Erik Roelof Loopstra, Harry Borggreve
  • Publication number: 20040041104
    Abstract: A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.
    Type: Application
    Filed: June 10, 2003
    Publication date: March 4, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paulus Martinus Maria Liebregts, Arno Jan Bleeker, Erik Roelof Loopstra, Harry Borggreve