Abstract: A reduced pressure induction heated reactor and method for the deposition, especially epitaxial deposition, onto workpieces placed in the reactor. The workpieces are positioned within a hollow susceptor which is, in turn, positioned within a reactor tube. The ends of the reactor tube are sealed by end caps which provide for input and exhaust of reactant species. The workpieces are inductively heated by an RF induction coil which surrounds the reactor tube and which inductively couples with the susceptor. A vacuum pump maintains a low pressure within the reactor tube. Low pressure deposition is made possible without arcing by shorting together the susceptor and end caps and by having the shorted together combination electrically floating.