Abstract: In this disclosure, a system is described, comprising a shear device with at least one inlet and at least one outlet and a mixing vessel with at least one inlet and at least one outlet, wherein an inlet of the shear device is in fluid communication with an outlet of the mixing vessel. In certain embodiments, the shear device and the mixing vessel form a loop for fluid communication. Also disclosed herein is a method of high shear oxidation, comprising mixing an oxidant with a substrate to form a substrate-oxidant mixture and applying shear to the substrate-oxidant mixture to form a product. The product includes ethylene oxide, propylene oxide, terephthalic acid, phenol, acrylonitrile, maleic anhydride, phthalic anhydride, nitric acid, caprolactam, oxidized polyethylene, oxidized polypropylene, oxidized polyethylene copolymers, and oxidized polypropylene copolymers. Suitable oxidant includes air, oxygen, ozone, peroxide, organic peroxide, halogen, oxygen-containing gas, and halogen-containing gas.

Abstract: In this disclosure, a system is described, comprising a shear device with at least one inlet and at least one outlet and a mixing vessel with at least one inlet and at least one outlet, wherein an inlet of the shear device is in fluid communication with an outlet of the mixing vessel. In certain embodiments, the shear device and the mixing vessel form a loop for fluid communication. Also disclosed herein is a method of high shear oxidation, comprising mixing an oxidant with a substrate to form a substrate-oxidant mixture and applying shear to the substrate-oxidant mixture to form a product. The product includes ethylene oxide, propylene oxide, terephthalic acid, phenol, acrylonitrile, maleic anhydride, phthalic anhydride, nitric acid, caprolactam, oxidized polyethylene, oxidized polypropylene, oxidized polyethylene copolymers, and oxidized polypropylene copolymers. Suitable oxidant includes air, oxygen, ozone, peroxide, organic peroxide, halogen, oxygen-containing gas, and halogen-containing gas.