Patents by Inventor Harshil Kashyap

Harshil Kashyap has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240301552
    Abstract: Described herein is a method for performing an atomic layer deposition process to form a silicon doped oxide film on a surface of the substrate. The oxide film may be a hafnium-zirconium oxide film, or a zirconium oxide film. The atomic layer deposition process may include forming the oxide layers and a silicon layer using a hydrogen peroxide as at least one of the precursors used in formation of the oxide layers.
    Type: Application
    Filed: March 9, 2023
    Publication date: September 12, 2024
    Inventors: Harshil Kashyap, Andrew C. Kummel, Ajay Kumar Yadav, Keith T. Wong, Srinivas Nemani, Ellie Yieh