Patents by Inventor Hartmut Bauch

Hartmut Bauch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080220164
    Abstract: In order to allow feeding for supply of a gaseous precursor for further processing while avoiding condensation, and in order to allow the feed process to be carried out as simply and reliably as possible, the invention provides a feed method as well as a feed device (1), comprising a vacuum pump (2) for evacuation of a storage vessel (3) for a precursor which is solid and/or liquid at room temperature and atmospheric pressure and for feeding the gaseous precursor which has been vaporized by evacuation, a first line section (23) on the inlet side of the vacuum pump (2) in order to produce a connection between the vacuum pump (2) and the storage vessel (3) for the solid and/or liquid precursor, at least one second line section (24) for supplying carrier gas to the vacuum pump (2), and a monitoring device (5) which can be connected to the first and the second line section (24) and, during operation of the apparatus, provides open-loop and/or closed-loop control for the flow rate of the gaseous precursor and/or o
    Type: Application
    Filed: March 5, 2008
    Publication date: September 11, 2008
    Applicant: SCHOTT AG
    Inventors: Hartmut Bauch, Todd Gudgel
  • Publication number: 20080210550
    Abstract: The invention provides a device for the vacuum coating of substrates which comprises a vacuum chamber, an apparatus for holding at least one substrate, at least one first coating region of the vacuum chamber with an apparatus for plasma pulse-induced chemical vapor deposition (PICVD) and at least one second coating region of the vacuum chamber with at least one apparatus for sputter coating, as well as a transport apparatus for transporting the substrate into the coating regions.
    Type: Application
    Filed: July 8, 2005
    Publication date: September 4, 2008
    Applicant: SCHOTT AG
    Inventors: Marten Walther, Tobias Kalber, Stefan Bauer, Hartmut Bauch, Jorn Gerban
  • Patent number: 7413767
    Abstract: A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained within a first supply container at a first temperature T1 and a first pressure p1. Precursor vapor of the precursor is supplied from the first supply container to an intermediate storage device through a first gas line which fluidly communicates the first supply container and the intermediate storage device. A carrier gas or reaction gas is supplied to the first gas line such that a mixture of the precursor with the carrier gas or the reaction gas is provided.
    Type: Grant
    Filed: December 16, 2004
    Date of Patent: August 19, 2008
    Assignee: Schott AG
    Inventors: Hartmut Bauch, Lars Bewig, Lutz Klippe, Thomas Küpper
  • Publication number: 20050132959
    Abstract: A gas supply device for delivering precursors with a low vapor pressure to CVD coating systems. The gas supply device has a supply container for the precursor which is at a first temperature T1, an intermediate storage device for intermediately storing the vaporous precursor at a second temperature T2 and at a constant pressure p2, a first gas line between the supply container and the intermediate storage device and a second gas line for removing gas from the intermediate storage device. The gas supply device is developed in such a way that the first temperature T1 is higher than the second temperature T2. The lower temperature T2 of the intermediate storage device facilitates maintenance work on the same, while the precursor evaporates at a greater rate at the higher temperature T1 in the supply container. A first precursor vapor may be mixed with a gas and/or a second precursor vapor in the intermediate storage device.
    Type: Application
    Filed: December 16, 2004
    Publication date: June 23, 2005
    Inventors: Hartmut Bauch, Lars Bewig, Lutz Klippe, Thomas Kupper
  • Publication number: 20030145789
    Abstract: The invention relates to a gas supply device for delivering precursors with a low vapor pressure to CVD coating systems. Said gas supply device has a supply container for the precursor which is at a first temperature T1, an intermediate storage device for intermediately storing the vaporous precursor at a second temperature T2 and at a constant pressure p2, a first gas line between the supply container and the intermediate storage device and a second gas line for removing gas from the intermediate storage device. According to the invention, the gas supply device is developed in such a way that the first temperature T1 is higher than the second temperature T2. The lower temperature T2 of the intermediate storage device facilitates maintenance work on the same, while the precursor evaporates at a greater rate at the higher temperature T1 in the supply container.
    Type: Application
    Filed: November 13, 2002
    Publication date: August 7, 2003
    Inventors: Hartmut Bauch, Lars Bewig, Lutz Klippe, Thomas Kupper
  • Patent number: 6595030
    Abstract: A device for producing optically homogeneous, streak-free quartz glass bodies having a large diameter including a furnace or melting device having an inner chamber with a pair of openings opposite one another. One or more movable burners are displaceable into one of the openings and the respective glass body to be produced is located in the other opening. Both the burner and glass body are movably positioned. In the course of the production of the quartz glass body, a relative movement is effected in the axial and radial directions between the burner and the quartz glass body such that the distance from the burner outlet opening pertaining to the quartz glass body decreases as the distance from the burner to the X-X axis of the quartz glass body increases.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: July 22, 2003
    Inventors: Hartmut Bauch, Hraban Hack, Frank Rudiger, Thomas Schindelbeck, Rolf Martin, Andreas Menzel, Matthias Schmidt, Roland Scholz, Andreas Voitsch
  • Patent number: 6177148
    Abstract: The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.
    Type: Grant
    Filed: May 10, 1999
    Date of Patent: January 23, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Marten Walther, Wolfgang Möhl, Burkhard Danielzik, Markus Kuhr, Roland Hochhaus, Hartmut Bauch, Martin Heming, Thomas K{umlaut over (u)}pper, Lars Bewig
  • Patent number: 5059231
    Abstract: For producing a fiberoptic waveguide preforms by plasma pulse-induced chemical vapor deposition (PICVD), blank glass tubes are prepared having a continuously increasing internal diameter in the direction of gas flow. This type of blank compensates for the otherwise occurring decrease in the density of the layer-forming molecules due to pressure drop, thereby permitting the formation of a uniform masswise deposition of layer-forming molecules along the length of the tube. This permits the production of collapsed preforms having a series of coating layers of substantially uniform thickness.
    Type: Grant
    Filed: September 12, 1989
    Date of Patent: October 22, 1991
    Assignee: Schott Glaswerke
    Inventors: Ulrich Ackermann, Hartmut Bauch, Volker Paquet
  • Patent number: 4859222
    Abstract: A method for the manufacture of a light wave guide providing a cladding and a light conducting core, from a glass tube, showing a material on or below its inner surface which forms the core of the finished light wave guide comprising at least one substance which is diffused out selectively of this material, forming the core subsequently, into the interior space of the glass tube, whereby during the diffusing-out process the partial pressure of the diffusing-out substance in the interior space of the glass tube is maintained as small as possible, whereby a premature collapsing of the glass tube during the diffusion process is prevented by adjusting an overpressure in the glass tube, that the glass tube after the diffusing out process is largely collapsed by rinsing with a rinsing gas and in a last collapsing step is completely collapsed to a rod (perform) without rinsing with a rinsing gas and that the rod is subsequently drawn out to a fiber.
    Type: Grant
    Filed: October 7, 1988
    Date of Patent: August 22, 1989
    Assignee: Schott Glaswerke
    Inventors: Hartmut Bauch, Peter Krause, Ulrike Jost, Ralf Kersten, Volker Paquet, Wolfgang Siefert