Abstract: The invention concerns an optical element (1) with an optical axis (3), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (2, 2?) in the direction of the optical axis (3). A device (11) enables to induce a two-wave or multiple wave deformation in said optical element (1). At least a system (12) mounted in the extension zone (2, 2?) is designed to apply a force in said extension (2, 2?).

Abstract: An apparatus for adjusting devices and for setting adjustments, in particular in a ?m range, nm range and below, in particular of optical elements in semiconductor lithography, comprising a base part and a head part spaced apart therefrom, the two parts being connected to one another by at least one adjustment device, and the adjustment device having side parts, the angle of which, or the spacing between which, can be adjusted or set by a length-adjustment device.

Abstract: The invention relates to a device for manipulation of the angular position of an object relative to a fixed structure, into which the object, in particular an optical element of a lens group for microlithography, is introduced, about three rotational axes, intersecting at a point. The object can also be held in a support frame. The support frame, with the object is connected to the fixed structure by means of three connection limbs each with three rotational degrees of freedom and one translational degree of freedom. The angular position of the support frame is adjustable about each one of the three rotational axes by means of one of the connection limbs.

Abstract: An apparatus or mounting an optical element in an optical system, in particular a mirror or a lens, in a projection exposure machine, in particular a projection lens in semiconductor lithography, is connected to an external base structure with the aid of at least three articulation sites that are arranged on the circumference of the optical element and at which a bearing device acts in each case, wherein the bearing device has at least one bending element, resembling a leaf spring, arranged tangentially to the optical element, and at least one bending element, resembling a leaf spring, arranged in the radial direction relative to the optical element.

Abstract: A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.

Abstract: The invention concerns an optical element (1) with an optical axis (3), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (2, 2′) in the direction of the optical axis (3). A device (11) enables to induce a two-wave or multiple wave deformation in said optical element (1). At least a system (12) mounted in the extension zone (2, 2′) is designed to apply a force in said extension (2, 2′).

Abstract: The invention relates to an optical bench that has a base plate and can be permanently connected to an associated component. A receiving element for other optical elements that is arranged in such a way in relation to the base plate with connecting elements that it is deformable in its entirety in relation to said base plate, is allocated to the same.

Abstract: An apparatus or mounting an optical element in an optical system, in particular a mirror or a lens, in a projection exposure machine, in particular a projection lens in semiconductor lithography, is connected to an external base structure with the aid of at least three articulation sites that are arranged on the circumference of the optical element and at which a bearing device acts in each case, wherein the bearing device has at least one bending element, resembling a leaf spring, arranged tangentially to the optical element, and at least one bending element, resembling a leaf spring, arranged in the radial direction relative to the optical element.

Abstract: An apparatus for adjusting devices and for setting adjustments, in particular in a &mgr;m range, nm range and below, in particular of optical elements in semiconductor lithography, comprising a base part and a head part spaced apart therefrom., the two parts being connected to one another by at least one adjustment device, and the adjustment device having side parts, the angle of which, or the spacing between which, can be adjusted or see by a length-adjustment device.