Patents by Inventor Hartmut Siebert

Hartmut Siebert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8344069
    Abstract: The present invention relates to a polymer composition comprising a polyolefin base resin comprising (A) a propylene homopolymer with a MWD of 1.5 to 5.0, and (B) an ethylene copolymer with one or more comonomers selected from alphaolefins with 4 to 12 carbon atoms, having a density of not greater than 920 kg/m3 wherein the polyolefin base resin has a weight ratio of propylene homopolymer (A) to ethylene copolymer (B) from 95:5 to 60:40, the use of such a polymer composition for the manufacture of an injection molded article, an article produced from such a polymer composition, an article with a grained surface structure produced from such a polymer composition showing having a scratch resistance, determined as the difference of the luminance ?L at a load of 10 N, of not more than 1 and a gloss at an angle of 60° of not more than 2.8%, and the use of a polymer composition for the production of such an article.
    Type: Grant
    Filed: April 8, 2009
    Date of Patent: January 1, 2013
    Assignee: Borealis Technology Oy
    Inventors: Markus Gahleitner, Erwin Kastner, Hartmut Siebert, Manfred Stadlbauer
  • Patent number: 8138251
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Grant
    Filed: November 2, 2011
    Date of Patent: March 20, 2012
    Assignee: Lummus Novolen Technology GmbH
    Inventors: Jose Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Publication number: 20120046396
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Application
    Filed: November 2, 2011
    Publication date: February 23, 2012
    Applicant: Lummus Novolen Technology GmbH
    Inventors: José Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Patent number: 8076429
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: December 13, 2011
    Assignee: Lummus Novolen Technology GmbH
    Inventors: José Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Publication number: 20110060085
    Abstract: The present invention relates to a polymer composition comprising a polyolefin base resin comprising (A) a propylene homopolymer with a MWD of 1.5 to 5.0, and (B) an ethylene copolymer with one or more comonomers selected from alphaolefins with 4 to 12 carbon atoms, having a density of not greater than 920 kg/m3 wherein the polyolefin base resin has a weight ratio of propylene homopolymer (A) to ethylene copolymer (B) from 95:5 to 60:40, the use of such a polymer composition for the manufacture of an injection molded article, an article produced from such a polymer composition, an article with a grained surface structure produced from such a polymer composition showing having a scratch resistance, determined as the difference of the luminance ?L at a load of 10 N, of not more than 1 and a gloss at an angle of 60° of not more than 2.8%, and the use of a polymer composition for the production of such an article.
    Type: Application
    Filed: April 8, 2009
    Publication date: March 10, 2011
    Inventors: Markus Gahleitner, Erwin Kastner, Hartmut Siebert, Manfred Stadlbauer
  • Publication number: 20100234507
    Abstract: A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.
    Type: Application
    Filed: March 11, 2009
    Publication date: September 16, 2010
    Inventors: Jose Pezzutti, Alberto Benito, Guillermo Cassano, Leandro Roth, Werner Schoene, Hartmut Siebert, Andreas Winter, Anita Dimeska, Vassilios Galiatsatos
  • Patent number: 4628503
    Abstract: A method for performing a bus request or collective acknowledgement on a bus system, in a process bus system for serial data transmission, including subscribers of the process bus system, and a bus control device, includes generating a band-limited signal capable of superposition at all of the subscribers, in accordance with a common given principle, transmitting the band-limited signal with the subscribers for performing a bus request or collective acknowledgement, and analyzing the signal with the bus control device, and a device for carrying out the method.
    Type: Grant
    Filed: February 9, 1984
    Date of Patent: December 9, 1986
    Assignee: Brown, Boveri & Cie AG
    Inventors: Timm Grams, Werner Deck, Johannes Figge, Hartmut Siebert