Patents by Inventor Hartmut Steppan

Hartmut Steppan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5217845
    Abstract: A photopolymerizable mixture is described which contains a polymeric binder, a polymerizable compound and an acridine compound of the general formula I ##STR1## as photoinitiator, in which R.sup.1 denotes an optionally substituted alkyl or acyl group,R.sup.2, R.sup.3 are identical or different and denoteand R.sup.4 hydrogen or halogen atoms or optionally substituted alkyl or acyl groups,R.sup.5, R.sup.6 are identical or different and denoteand R.sup.7 hydrogen or halogen atoms or optionally substituted alkyl, aryl or acyl groups, or groups of the formula II ##STR2## The photoinitiators yield a mixture having high photosensitivity and have a lower tendency to diffusion than the known 9-phenylacridine.
    Type: Grant
    Filed: September 26, 1991
    Date of Patent: June 8, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Steppan, Hans-Dieter Frommeld
  • Patent number: 5200299
    Abstract: Compounds of the general formula I ##STR1## are described in which R.sup.1 is a group of the formula ##STR2## and R.sup.2 is a hydrogen atom or a methyl group, orR.sup.1 and R.sup.2 jointly form an optionally substituted 5- or 6-membered ring,R.sup.3 is a hydrogen atom, a methyl group or an optionally substituted phenyl group,R.sup.4 is a hydrogen or halogen atom, a methyl group, an optionally substituted benzoyl group or a group of the formula ##STR3## n is zero or 1, X is a hydrogen or chlorine atom, an alkyl group containing 1 to 4 carbon atoms or one of the groups OA, CH.sub.2 OA, CH.sub.2 NHA or C.sub.2 H.sub.4 OA, andA is an acryloyl or methacryloyl group,the compounds containing in each case at least one group A. The compounds are suitable for the production of photoresists and printing plates as diffusion-resistant photoinitiators in photopolymerizable mixtures.
    Type: Grant
    Filed: December 21, 1989
    Date of Patent: April 6, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Steppan, Hans-Dieter Frommeld
  • Patent number: 5162190
    Abstract: A compound of the general formula I ##STR1## in which D denotes a 1,2-naphthoquinone-2-diazide-4-sulfonyl or - 5-sulfonyl radical,R.sup.1 denotes an alkylene group andR.sup.2 denotes a hydrogen atom, an alkyl group or a group R.sup.1 --OH,or of the general formula II ##STR2## in which X denotes an alkylene group, an arylene group or a group of the formulaNH--Y--NH,wherein Y is an alkylene group or an arylene group,R.sup.3 denotes an alkylene group, which may be interrupted by ether oxygen atoms,n is a number from 1 to 40 andm is a number from 0 to 50,the ratio m:(m+n) being from 0:100 to 95:100 and R.sup.1 and D having the above-indicated meaning, are disclosed. The compounds may be used in positive-working photosenitive materials for the production of printing plates and photoresists. Compounds according to formula II do not require an addition of polymeric binders.
    Type: Grant
    Filed: June 29, 1989
    Date of Patent: November 10, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Wolfgang Zahn, Gerhard Buhr, Hartmut Steppan
  • Patent number: 4966828
    Abstract: Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.
    Type: Grant
    Filed: September 13, 1984
    Date of Patent: October 30, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Reinhard Doenges, Hans Ruckert, Ulrich Geissler, Hartmut Steppan
  • Patent number: 4956264
    Abstract: A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains:(a) a polymeric binder,(b) a compound of the formula: ##STR1## `in which A is O, NH or N-alkyl,Q is --CO--C.sub.p H.sub.2p -Z-- or --C.sub.k H.sub.2k O--,Z is O or NH,R.sup.1 is H or alkyl,R.sup.2 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or SO.sub.2 R.sup.3,R.sup.3 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or aryloxy,k is a number from 3 to 20,l is a number from 0 to 20,m is a number from 2 to 20,n is a number from 1 to 20 andp is a number from 2 to 10, and(c) a compound or a combination of compounds, which is capable of initiating the polymerization of the compound (b) under the action of actinic radiation.The mixture is especially suitable for the preparation of dry photoresist materials and is distinguished by good flexibility and adhesion to copper and by easy strippability in the light-cured state.
    Type: Grant
    Filed: January 22, 1986
    Date of Patent: September 11, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Ulrich Geissler, Hartmut Steppan, Walter Herwig
  • Patent number: 4776892
    Abstract: Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.
    Type: Grant
    Filed: August 22, 1986
    Date of Patent: October 11, 1988
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Steppan, Ulrich Geissler
  • Patent number: 4661432
    Abstract: A light-sensitive, diazonium group-containing polycondensation product is described which comprises(a) an optionally substituted diphenylamine-dianzonium salt I.(b) a compound corresponding to the formula IIR.sup.4 --O--CH.sub.2 --R.sup.5 (II)whereinR.sup.4 is H, alkyl or acyl, andR.sup.5 is an optionally substituted aromatic radical, and(c) a compound corresponding to the formula IIIR.sup.6 --O--CH.sub.2 --R.sup.8 --CH.sub.2 --O--R.sup.7 (III)whereinR.sup.6 and R.sup.7 are H, alkyl, or acyl andR.sup.8 is the radical of a compound selected from the group consisting of aromatic hydrocarbons, phenols, phenolethers, aromatic thioethers, aromatic heterocyclic compounds, and organic acid amides,with the radicals resulting from compound II being directing linked to the units of the diazonium salt I.In the production of the polycondensation product, I is first condensed with II and then with III.
    Type: Grant
    Filed: January 23, 1986
    Date of Patent: April 28, 1987
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Walter Lutz, Hartmut Steppan
  • Patent number: 4659645
    Abstract: A photosensitive mixture comprised of(a) a diazonium salt polycondensation product comprising recurring units of the formulas A--N.sub.2 X and B, which units are linked by bivalent intermediate members derived from a carbonyl compound which is capable of condensation, wherein the A--N.sub.2 X units are derived from aromatic diazonium compounds that are capable of condensation with formaldehyde, and the B units are derived from compounds which are free from diazonium groups and are also capable of condensation with formaldehyde in a strongly acidic medium;(b) a compound which can be polymerized by a free-radical process;(c) a photopolymerization initiator; and(d) a polymeric binder that is insoluble in water, but soluble in organic solventscan be used in the production of photosensitive printing plates and photoresists.
    Type: Grant
    Filed: July 9, 1985
    Date of Patent: April 21, 1987
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Dieter Frommeld, Walter Lutz, Hartmut Steppan
  • Patent number: 4506003
    Abstract: A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.
    Type: Grant
    Filed: November 14, 1983
    Date of Patent: March 19, 1985
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans Ruckert, Gerhard Buhr, Hartmut Steppan
  • Patent number: 4492748
    Abstract: A light-sensitive diazonium group-containing polycondensation product of a diazonium salt corresponding to the general formula ##STR1## wherein R.sup.1, R.sup.2, and R.sup.3 denote hydrogen atoms, halogen atoms, alkyl groups having 1 to 3 carbon atoms or alkoxy groups having 1 to 6 carbon atoms, andX denotes the anion of the diazonium salt,and an aldehyde selected from the group consisting of dialdehydes, acetals of dialdehyde hydrates, and esters of dialdehyde hydrates, a process for producing such a light-sensitive polycondensation product and a light-sensitive recording material comprising a layer support and a light-sensitive layer containing such a light-sensitive polycondensation product.
    Type: Grant
    Filed: September 8, 1982
    Date of Patent: January 8, 1985
    Inventors: Walter Lutz, Hartmut Steppan, Fritz Erdmann
  • Patent number: 4401520
    Abstract: This invention relates to an improvement in the process for the preparation of screen printing stencils by an electroplating method, which comprises coating a metallic matrix, provided in the manner of a screen with dots of insulating material, with a photoresist layer, exposing the photoresist layer imagewise and developing it by washing out, and rendering those areas of the photoresist layer which have remained in place electrically conductive in the course of imaging, electrodepositing metal up to a desired height on the conductive image stencil and on the matrix ridges surrounding the insulating screen dots, and removing the patterned screen printing stencil thus obtained from the matrix, the improvement which comprises rendering the photoresist layer conductive only on its surface and before developing.
    Type: Grant
    Filed: March 18, 1981
    Date of Patent: August 30, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Steppan, Barbara Wildenhain, Hans Ruckert
  • Patent number: 4159202
    Abstract: This invention relates to a photo-cross-linkable polymer containing units each having a 2-pyridone side group. The invention also relates to a photosensitive copying material including the novel photo-cross-linkable polymer.
    Type: Grant
    Filed: May 26, 1977
    Date of Patent: June 26, 1979
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Harald Furrer, Hartmut Steppan, Gerhard Lohaus
  • Patent number: 4021243
    Abstract: This invention relates to a light-sensitive copying composition for the preparation of screen printing stencils comprising a condensation product of an aromatic diazonium compound in admixture with a hydrophilic hardenable binder, the condensation product containing at least one unit each of the general types A(-D).sub.
    Type: Grant
    Filed: January 22, 1976
    Date of Patent: May 3, 1977
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Steppan, Hans Ruckert
  • Patent number: 3985566
    Abstract: Polymers capable of being cross-linked by light, which comprise units having lateral substituted 1-carbonyloxy-1H-naphthalene-2-one groups of the formula ##SPC1##Where R is hydrogen or methyl; R.sub.1 is a streight-chain or branched, saturated or unsaturated hydrocarbon radical having from 1 to 3 carbon atoms, in which a hydrogen atom may be substituted by cyano, (C.sub.1 to C.sub.2) alkoxy, carbo-(C.sub.1 to C.sub.2)-alkoxy, (C.sub.1 to C.sub.2)acyl or (C.sub.1 to C.sub.2)acyloxy and R.sub.2 and R.sub.3, independently, each are (C.sub.1 to C.sub.4)alkyl or chlorine; and R.sub.4 is (C.sub.1 to C.sub.4)alkyl, nitro, chlorine or bromine, are provided.
    Type: Grant
    Filed: February 12, 1975
    Date of Patent: October 12, 1976
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Gerhard Buhr, Hartmut Steppan
  • Patent number: 3969323
    Abstract: This invention relates to a photo-crosslinkable polymer comprising units with side chains having 2-pyrone groups therein. The invention also relates to processes for the preparation of the novel photo-crosslinkable polymers and to a photo-curable copying composition including the photo-crosslinkable polymer.
    Type: Grant
    Filed: February 26, 1974
    Date of Patent: July 13, 1976
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Harald Furrer, Hartmut Steppan, Gerhard Lohaus