Patents by Inventor Haruhiko Doi

Haruhiko Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220002588
    Abstract: Provided is a polishing liquid composition that is able to improve the polishing rate of a silicon oxide film in one aspect. An aspect of the present disclosure relates to a polishing liquid composition for a silicon oxide film. The polishing liquid composition contains cerium oxide particles (component A), an additive (component B), and an aqueous medium. The component B is a compound having a reduction potential of (145 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry (with an Ag/AgCl electrode as a reference).
    Type: Application
    Filed: September 18, 2019
    Publication date: January 6, 2022
    Applicant: KAO CORPORATION
    Inventors: Haruhiko DOI, Norihito YAMAGUCHI, Masato SUGAHARA, Takanao SEIKE, Masaki INOUE
  • Patent number: 10703935
    Abstract: Provided is a polishing composition for a silicon oxide film that can improve the speed of polishing a silicon oxide film. In one or more embodiments, a polishing composition for a silicon oxide film contains: water; a cerium oxide particle; and a compound having in its molecule an amino group and at least one acid group selected from a sulfonic acid group and a phosphonic acid group. In the polishing composition, [the number of moles of the acid group contained in the compound]/[total surface area of the cerium oxide particle] is in a range from 1.6×10?5 mol/m2 to 5.0×10?2 mol/m2.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: July 7, 2020
    Assignee: KAO CORPORATION
    Inventors: Haruhiko Doi, Koji Kinuta
  • Publication number: 20200024481
    Abstract: Provided is a polishing composition capable of improving polishing selectivity and reducing polishing unevenness while increasing polishing rate. The present disclosure relates to a polishing composition containing: cerium oxide particles A; an oligosaccharide B; and water. The oligosaccharide B contains a saccharide made up of 3 to 5 glucoses linked together. In the oligosaccharide B, a content of a saccharide made up of 8 or more glucoses linked together is 27 mass % or less.
    Type: Application
    Filed: September 28, 2017
    Publication date: January 23, 2020
    Applicant: Kao Corporation
    Inventors: Haruhiko DOI, Tsubasa OYAMA
  • Publication number: 20190241766
    Abstract: Provided is a polishing composition capable of improving polishing selectivity and reducing polishing unevenness while increasing polishing rate. The present disclosure relates to a polishing composition containing; cerium oxide particles A; a polysaccharide B having a weight average molecular weight of 800 or more and 2800 or less; and water.
    Type: Application
    Filed: September 28, 2017
    Publication date: August 8, 2019
    Applicant: KAO CORPORATION
    Inventor: Haruhiko DOI
  • Publication number: 20170292038
    Abstract: Provided is a polishing composition for a silicon oxide film that can improve the speed of polishing a silicon oxide film. In one or more embodiments, a polishing composition for a silicon oxide film contains: water; a cerium oxide particle; and a compound having in its molecule an amino group and at least one acid group selected from a sulfonic acid group and a phosphonic acid group. In the polishing composition, [the number of moles of the acid group contained in the compound]/[total surface area of the cerium oxide particle] is in a range from 1.6×10?5 mol/m2 to 5.0×10?2 mol/m2.
    Type: Application
    Filed: September 25, 2015
    Publication date: October 12, 2017
    Applicant: Kao Corporation
    Inventors: Haruhiko DOI, Koji KINUTA
  • Patent number: 9070399
    Abstract: There is provided a polishing composition for a magnetic disk substrate that can reduce scratches, nanoprotrusion defects, and substrate surface waviness after polishing. The polishing composition for a magnetic disk substrate that contains: a copolymer that has a constituent unit derived from a monomer having a solubility of 2 g or less in 100 g of water at 20° C. and a constituent unit having a sulfonic acid group, and has a saturated hydrocarbon chain as the main chain thereof, or a salt of the copolymer; an abrasive; and water.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: June 30, 2015
    Assignee: Kao Corporation
    Inventors: Takeshi Hamaguchi, Haruhiko Doi
  • Patent number: 9053736
    Abstract: A method for manufacturing an aluminosilicate glass substrate for a hard disk of the present invention includes polishing an aluminosilicate glass substrate to be polished with a polishing composition that includes silica particles, a polymer having a sulfonic acid group, and water, wherein an adsorption constant of the polymer having the sulfonic acid group on aluminosilicate glass is 1.5 to 5.0 L/g. The polymer having the sulfonic acid group is preferably a polymer having an aromatic ring. The weight average molecular weight of the polymer having the sulfonic acid group is 3000 to 100000.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: June 9, 2015
    Assignee: Kao Corporation
    Inventors: Haruhiko Doi, Yosuke Uchino, Kazuhiko Nishimoto
  • Publication number: 20140346138
    Abstract: A polishing composition for a magnetic disk substrate of the present invention includes water, silica particles, and at least one or more selected from an acid, a salt of the acid, and an oxidizing agent. The silica particles are observed with a transmission electron microscope to measure a maximum diameter and a projected area of each particle, and a value obtained by dividing the area of a circle whose diameter is the maximum diameter of a silica particle by the projected area of the silica particle and multiplying the result by 100, is in the range of 100 to 130.
    Type: Application
    Filed: August 12, 2014
    Publication date: November 27, 2014
    Inventors: Yoshiaki OSHIMA, Norihito YAMAGUCHI, Haruhiko DOI
  • Publication number: 20140335763
    Abstract: The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and a method for manufacturing a magnetic disk substrate using the polishing composition. The polishing composition for a magnetic disk substrate includes colloidal silica having a ?CV value of 0 to 10% and water.
    Type: Application
    Filed: July 29, 2014
    Publication date: November 13, 2014
    Inventors: Yoshiaki OSHIMA, Takeshi HAMAGUCHI, Kanji SATO, Norihito YAMAGUCHI, Haruhiko DOI
  • Patent number: 8834589
    Abstract: A polishing composition for a magnetic disk substrate of the present invention includes water, silica particles, and at least one or more selected from an acid, a salt of the acid, and an oxidizing agent. The silica particles are observed with a transmission electron microscope to measure a maximum diameter and a projected area of each particle, and a value obtained by dividing the area of a circle whose diameter is the maximum diameter of a silica particle by the projected area of the silica particle and multiplying the result by 100, is in the range of 100 to 130.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: September 16, 2014
    Assignee: Kao Corporation
    Inventors: Yoshiaki Oshima, Norihito Yamaguchi, Haruhiko Doi
  • Publication number: 20130220973
    Abstract: Provided is a method for producing a glass hard disk substrate, including steps of polishing a glass substrate with an acidic polishing liquid; and subjecting the obtained substrate to alkali cleaning. This method can inhibit degradation of surface roughness of the glass substrate in the alkali cleaning step while maintaining a polishing rate in the polishing step, and further can improve cleanliness. The method for producing a glass hard disk substrate includes the following steps (1) and (2): (1) polishing a glass substrate to be polished using a polishing composition of pH 1.0-4.2 that contains a polyvalent amine compound having 2 to 10 nitrogen atoms in the molecule; and (2) cleaning the substrate obtained in the step (1) using a cleaner composition of pH 8.0-13.0.
    Type: Application
    Filed: October 26, 2011
    Publication date: August 29, 2013
    Applicant: KAO CORPORATION
    Inventors: Haruhiko Doi, Nobuyuki Aono
  • Publication number: 20130032571
    Abstract: A method for manufacturing an aluminosilicate glass substrate for a hard disk of the present invention includes polishing an aluminosilicate glass substrate to be polished with a polishing composition that includes silica particles, a polymer having a sulfonic acid group, and water, wherein an adsorption constant of the polymer having the sulfonic acid group on aluminosilicate glass is 1.5 to 5.0 L/g. The polymer having the sulfonic acid group is preferably a polymer having an aromatic ring. The weight average molecular weight of the polymer having the sulfonic acid group is 3000 to 100000.
    Type: Application
    Filed: April 19, 2011
    Publication date: February 7, 2013
    Applicant: KAO CORPORATION
    Inventors: Haruhiko Doi, Yosuke Uchino, Kazuhiko Nishimoto
  • Publication number: 20110240594
    Abstract: There is provided a polishing composition for a magnetic disk substrate that can reduce scratches, nanoprotrusion defects, and substrate surface waviness after polishing. The polishing composition for a magnetic disk substrate that contains: a copolymer that has a constituent unit derived from a monomer having a solubility of 2 g or less in 100 g of water at 20° C. and a constituent unit having a sulfonic acid group, and has a saturated hydrocarbon chain as the main chain thereof, or a salt of the copolymer; an abrasive; and water.
    Type: Application
    Filed: December 18, 2009
    Publication date: October 6, 2011
    Inventors: Takeshi Hamaguchi, Haruhiko Doi
  • Publication number: 20110203186
    Abstract: The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and a method for manufacturing a magnetic disk substrate using the polishing composition. The polishing composition for a magnetic disk substrate includes colloidal silica having a ? CV value of 0 to 10% and water.
    Type: Application
    Filed: November 4, 2009
    Publication date: August 25, 2011
    Inventors: Yoshiaki Oshima, Takeshi Hamaguchi, Kanji Sato, Norihito Yamaguchi, Haruhiko Doi
  • Publication number: 20070254563
    Abstract: A polishing composition for a magnetic disk substrate of the present invention includes water, silica particles, and at least one or more selected from an acid, a salt of the acid, and an oxidizing agent. The silica particles are observed with a transmission electron microscope to measure a maximum diameter and a projected area of each particle, and a value obtained by dividing the area of a circle whose diameter is the maximum diameter of a silica particle by the projected area of the silica particle and multiplying the result by 100, is in the range of 100 to 130.
    Type: Application
    Filed: April 26, 2007
    Publication date: November 1, 2007
    Inventors: Yoshiaki Oshima, Norihito Yamaguchi, Haruhiko Doi