Patents by Inventor Haruhiko Hatano
Haruhiko Hatano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10784074Abstract: The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.Type: GrantFiled: November 29, 2016Date of Patent: September 22, 2020Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Takeshi Sunaoshi, Yoshihisa Orai, Haruhiko Hatano, Takashi Mizuo
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Patent number: 10269533Abstract: In conventional structures, a space between a dual cooling tank is vacuum insulated, and a cooling part is cooled via a highly thermally conductive material connected to an inner container. Such structures are affected by heat infiltrating into the highly thermally conductive material and the cooling part. For instance, in cases when liquid nitrogen is used as a coolant, it takes approximately 30 minutes for the temperature to reach ?120° C. Even in cases when a significant amount of time has been spent, the temperature only reaches approximately ?150° C., and thus falls significantly short of the temperature of liquid nitrogen, namely ?196° C.Type: GrantFiled: September 18, 2014Date of Patent: April 23, 2019Assignee: Hitachi High-Technologies CorporationInventors: Takashi Mizuo, Yusuke Tamba, Haruhiko Hatano, Kazutaka Nimura
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Publication number: 20180350554Abstract: The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.Type: ApplicationFiled: November 29, 2016Publication date: December 6, 2018Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Takeshi SUNAOSHI, Yoshihisa ORAI, Haruhiko HATANO, Takashi MIZUO
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Publication number: 20160203940Abstract: In conventional structures, a space between a dual cooling tank is vacuum insulated, and a cooling part is cooled via a highly thermally conductive material connected to an inner container. Such structures are affected by heat infiltrating into the highly thermally conductive material and the cooling part. For instance, in cases when liquid nitrogen is used as a coolant, it takes approximately 30 minutes for the temperature to reach ?120° C. Even in cases when a significant amount of time has been spent, the temperature only reaches approximately ?150° C., and thus falls significantly short of the temperature of liquid nitrogen, namely ?196° C.Type: ApplicationFiled: September 18, 2014Publication date: July 14, 2016Applicant: Hitachi High-Technologies CorporationInventors: Takashi MIZUO, Yusuke TAMBA, Haruhiko HATANO, Kazutaka NIMURA
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Patent number: 9159530Abstract: The present invention makes it possible, even when using an ordinary electron beam device (not an environment-controlled electron beam device), to create locally a low vacuum condition in the vicinity of a sample and cool said sample by means of a sample holder alone, without modifying the device or adding equipment such as a gas cylinder. The sample to be observed is placed in a sample holder provided with: a vessel that can contain a substance to serve as a gas source; and a through-hole in the bottom of a sample mount on said vessel. Via the through-hole, gas evaporating or volatilizing from the vessel is supplied to the sample under observation, thereby creating a localized low-vacuum state at or in the vicinity of the sample. Also, the heat of vaporization required for volatilization can be used to cool the sample.Type: GrantFiled: October 28, 2011Date of Patent: October 13, 2015Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kotaro Hosoya, Masaomi Ohno, Haruhiko Hatano
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Patent number: 8921784Abstract: There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.Type: GrantFiled: November 12, 2010Date of Patent: December 30, 2014Assignee: Hitachi High-Technologies CorporationInventors: Toru Iwaya, Sakae Kobori, Tomohisa Ohtaki, Haruhiko Hatano
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Patent number: 8766184Abstract: With a scanning electron microscope (SEM) adopting a commonly available exhaust system such as a turbo-molecular pump, an ion pump, or a rotary pump, and so forth, there is realized an apparatus capable of safely executing observation, or adsorption of a target substance that is high in rarity. Further, there is realized a safe SEM low in the risk of an electrical discharge by providing the apparatus with a probe, a means for replacing an atmosphere in a specimen chamber, with a predetermined gas, and a means for forming an image by detection of an ion current, and detection of an absorption current. Further, there is provided a means for controlling the polarity of a voltage applied to the probe. Still further, there is provided a control means for controlling a value of the voltage applied to the probe according to a degree of vacuum.Type: GrantFiled: November 2, 2011Date of Patent: July 1, 2014Assignee: Hitachi High-Technologies CorporationInventors: Haruhiko Hatano, Hiroyuki Suzuki, Yoshihiko Nakayama
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Publication number: 20140014835Abstract: The present invention makes it possible, even when using an ordinary electron beam device (not an environment-controlled electron beam device), to create locally a low vacuum condition in the vicinity of a sample and cool said sample by means of a sample holder alone, without modifying the device or adding equipment such as a gas cylinder. The sample to be observed is placed in a sample holder provided with: a vessel that can contain a substance to serve as a gas source; and a through-hole in the bottom of a sample mount on said vessel. Via the through-hole, gas evaporating or volatilizing from the vessel is supplied to the sample under observation, thereby creating a localized low-vacuum state at or in the vicinity of the sample. Also, the heat of vaporization required for volatilization can be used to cool the sample.Type: ApplicationFiled: October 28, 2011Publication date: January 16, 2014Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kotaro Hosoya, Masaomi Ohno, Haruhiko Hatano
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Publication number: 20130284923Abstract: With a scanning electron microscope (SEM) adopting a commonly available exhaust system such as a turbo-molecular pump, an ion pump, or a rotary pump, and so forth, there is realized an apparatus capable of safely executing observation, or adsorption of a target substance that is high in rarity. Further, there is realized a safe SEM low in the risk of an electrical discharge by providing the apparatus with a probe, a means for replacing an atmosphere in a specimen chamber, with a predetermined gas, and a means for forming an image by detection of an ion current, and detection of an absorption current. Further, there is provided a means for controlling the polarity of a voltage applied to the probe. Still further, there is provided a control means for controlling a value of the voltage applied to the probe according to a degree of vacuum.Type: ApplicationFiled: November 2, 2011Publication date: October 31, 2013Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Haruhiko Hatano, Hiroyuki Suzuki, Yoshihiko Nakayama
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Publication number: 20120211654Abstract: There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.Type: ApplicationFiled: November 12, 2010Publication date: August 23, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Toru Iwaya, Sakae Kobori, Tomohisa Ohtaki, Haruhiko Hatano