Patents by Inventor Haruhiko Hatano

Haruhiko Hatano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10784074
    Abstract: The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: September 22, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takeshi Sunaoshi, Yoshihisa Orai, Haruhiko Hatano, Takashi Mizuo
  • Patent number: 10269533
    Abstract: In conventional structures, a space between a dual cooling tank is vacuum insulated, and a cooling part is cooled via a highly thermally conductive material connected to an inner container. Such structures are affected by heat infiltrating into the highly thermally conductive material and the cooling part. For instance, in cases when liquid nitrogen is used as a coolant, it takes approximately 30 minutes for the temperature to reach ?120° C. Even in cases when a significant amount of time has been spent, the temperature only reaches approximately ?150° C., and thus falls significantly short of the temperature of liquid nitrogen, namely ?196° C.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: April 23, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Mizuo, Yusuke Tamba, Haruhiko Hatano, Kazutaka Nimura
  • Publication number: 20180350554
    Abstract: The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.
    Type: Application
    Filed: November 29, 2016
    Publication date: December 6, 2018
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takeshi SUNAOSHI, Yoshihisa ORAI, Haruhiko HATANO, Takashi MIZUO
  • Publication number: 20160203940
    Abstract: In conventional structures, a space between a dual cooling tank is vacuum insulated, and a cooling part is cooled via a highly thermally conductive material connected to an inner container. Such structures are affected by heat infiltrating into the highly thermally conductive material and the cooling part. For instance, in cases when liquid nitrogen is used as a coolant, it takes approximately 30 minutes for the temperature to reach ?120° C. Even in cases when a significant amount of time has been spent, the temperature only reaches approximately ?150° C., and thus falls significantly short of the temperature of liquid nitrogen, namely ?196° C.
    Type: Application
    Filed: September 18, 2014
    Publication date: July 14, 2016
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Takashi MIZUO, Yusuke TAMBA, Haruhiko HATANO, Kazutaka NIMURA
  • Patent number: 9159530
    Abstract: The present invention makes it possible, even when using an ordinary electron beam device (not an environment-controlled electron beam device), to create locally a low vacuum condition in the vicinity of a sample and cool said sample by means of a sample holder alone, without modifying the device or adding equipment such as a gas cylinder. The sample to be observed is placed in a sample holder provided with: a vessel that can contain a substance to serve as a gas source; and a through-hole in the bottom of a sample mount on said vessel. Via the through-hole, gas evaporating or volatilizing from the vessel is supplied to the sample under observation, thereby creating a localized low-vacuum state at or in the vicinity of the sample. Also, the heat of vaporization required for volatilization can be used to cool the sample.
    Type: Grant
    Filed: October 28, 2011
    Date of Patent: October 13, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kotaro Hosoya, Masaomi Ohno, Haruhiko Hatano
  • Patent number: 8921784
    Abstract: There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.
    Type: Grant
    Filed: November 12, 2010
    Date of Patent: December 30, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toru Iwaya, Sakae Kobori, Tomohisa Ohtaki, Haruhiko Hatano
  • Patent number: 8766184
    Abstract: With a scanning electron microscope (SEM) adopting a commonly available exhaust system such as a turbo-molecular pump, an ion pump, or a rotary pump, and so forth, there is realized an apparatus capable of safely executing observation, or adsorption of a target substance that is high in rarity. Further, there is realized a safe SEM low in the risk of an electrical discharge by providing the apparatus with a probe, a means for replacing an atmosphere in a specimen chamber, with a predetermined gas, and a means for forming an image by detection of an ion current, and detection of an absorption current. Further, there is provided a means for controlling the polarity of a voltage applied to the probe. Still further, there is provided a control means for controlling a value of the voltage applied to the probe according to a degree of vacuum.
    Type: Grant
    Filed: November 2, 2011
    Date of Patent: July 1, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Haruhiko Hatano, Hiroyuki Suzuki, Yoshihiko Nakayama
  • Publication number: 20140014835
    Abstract: The present invention makes it possible, even when using an ordinary electron beam device (not an environment-controlled electron beam device), to create locally a low vacuum condition in the vicinity of a sample and cool said sample by means of a sample holder alone, without modifying the device or adding equipment such as a gas cylinder. The sample to be observed is placed in a sample holder provided with: a vessel that can contain a substance to serve as a gas source; and a through-hole in the bottom of a sample mount on said vessel. Via the through-hole, gas evaporating or volatilizing from the vessel is supplied to the sample under observation, thereby creating a localized low-vacuum state at or in the vicinity of the sample. Also, the heat of vaporization required for volatilization can be used to cool the sample.
    Type: Application
    Filed: October 28, 2011
    Publication date: January 16, 2014
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kotaro Hosoya, Masaomi Ohno, Haruhiko Hatano
  • Publication number: 20130284923
    Abstract: With a scanning electron microscope (SEM) adopting a commonly available exhaust system such as a turbo-molecular pump, an ion pump, or a rotary pump, and so forth, there is realized an apparatus capable of safely executing observation, or adsorption of a target substance that is high in rarity. Further, there is realized a safe SEM low in the risk of an electrical discharge by providing the apparatus with a probe, a means for replacing an atmosphere in a specimen chamber, with a predetermined gas, and a means for forming an image by detection of an ion current, and detection of an absorption current. Further, there is provided a means for controlling the polarity of a voltage applied to the probe. Still further, there is provided a control means for controlling a value of the voltage applied to the probe according to a degree of vacuum.
    Type: Application
    Filed: November 2, 2011
    Publication date: October 31, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Haruhiko Hatano, Hiroyuki Suzuki, Yoshihiko Nakayama
  • Publication number: 20120211654
    Abstract: There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.
    Type: Application
    Filed: November 12, 2010
    Publication date: August 23, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toru Iwaya, Sakae Kobori, Tomohisa Ohtaki, Haruhiko Hatano