Patents by Inventor Haruhiko Nomura

Haruhiko Nomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device manufacturing apparatus, method for removing reaction product, and method of suppressing deposition of reaction product
    Patent number: 5795399
    Abstract: A plasma etching apparatus has a first load-lock chamber, a process chamber connected to the first load-lock chamber through a gate valve, and a second load-lock chamber connected to the process chamber through another gate valve. A first processing section is provided to the process chamber to etch a wafer. A second processing section is provided to the second load-lock chamber to remove a reaction product generated during etching from the wafer. In the second processing section, an ultrasonic wave is applied to the wafer, thereby removing the reaction product from the wafer.
    Type: Grant
    Filed: June 29, 1995
    Date of Patent: August 18, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Makoto Hasegawa, Atsuo Sanda, Haruhiko Nomura