Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their us for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Novel isothiazolecarboxamides of the formula 1

Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Isothiazolecarboxamides of the formula: wherein X, Y, R1, R2, R3 and R4 have the meanings given in the specification, may be used as microbicides.

Abstract: Isothiazolecarboxamides of the formula: 1

Abstract: Novel isothiazolecarboxamides of the formula 1

Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms.

Abstract: Novel isothiazolecarboxamides of the formula in which R is as defined in the description, a plurality of processes for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Novel isothiazolecarboxylic acid derivatives of the formula in which R is as defined in the description, a process for preparing the novel compounds and their use for protecting plants against attack by undesirable microorganisms and animal pests.

Abstract: Novel chloropyridylcarbonyl derivatives of the formula ##STR1## in which Het is ##STR2## n is 1 or 2, R.sup.1 is hydrogen, optionally substituted C.sub.1-6 alkyl, optionally substituted C.sub.2-6 alkenyl, optionally substituted C.sub.3-6 alkynyl, optionally substituted phenyl or optionally substituted pyrimidinyl, andR.sup.2 and R.sup.3, independently of each other, are hydrogen or C.sub.1-4 alkyl,and acid addition salts and metal salt complexes thereof,are outstandingly active as microbicides.

Abstract: Combatting fungi and bacteria with quinoline derivatives of the formula ##STR1## in which X is a nitrogen atom and Y is a CH-group orY is a nitrogen atom and X is a CH-group,R is hydrogen, halogen, acetyl or alkyl which is optionally substituted by one to three radicals independently selected from the group consisting of alkoxy, phenyl, hydroxy, halogen and cyano, orR is alkenyl which is optionally substituted by one to three radicals independently selected from the group consisting of halogen, cyano, alkoxy, phenyl and hydroxy, orR is alkynyl which is optionally substituted by one to three radicals independently selected from the group consisting of halogen, phenyl, trimethylsilyl, hydroxy, cyano, alkoxy, alkylamino, dialkylamino, alkylcarbonyl, tolyl, alkoxycarbonyl and alkylcarbonyloxy, orR is cycloalkyl which is optionally substituted by one to three radicals independently selected from the group consisting of halogen and cyano,A is hydrogen or halogen andB is halogen or halogenoalkyl,or an acid addition

Abstract: A composite for radiography is disclosed which essentially consists of a) a silver halide photographic light-sensitive material comprising a transparent support and at least one light-sensitive silver halide emulsion layer provided on each side of the support, b) fluorescent screen A having a 80 kVp X-ray energy absorption of 40% or more and c) fluorescent screen B having a 80 kVp X-ray energy absorption of 50% or more and the absorption more than fluorescent screen A, the material being sandwiched between the screens A and B in such a manner that emulsion layer A is in close contact with screen A and emulsion layer B is in close contact with screen B, wherein the slope of the straight portion in the characteristic curve of emulsion layer A is less than that of emulsion layer B and emulsion layers A and B of the silver halide photographic light-sensitive material have sensitivity on an exposed side that an exposure necessary to give a density of the minimum density +0.5 is 0.027 to 0.040 lux.multidot.second.

Abstract: A light-sensitive silver halide photographic material is disclosed. The light-sensitive material comprises transparent support having on each side, side-A and side-B, thereof a silver halide emulsion layer and has a specified balance in speeds of the emulsion layers each provided on side-A and side-B. A specimen obtained by exposing said light-sensitive material from its one side, side-A, followed by processing has a density higher than fog density of side-B by 0.10 or more on side-B of said light-sensitive material when the amount of exposure gives a density higher than fog density of side-A by 0.2; and a density higher than fog density of side-B by 0.70 or less on side-B of said light-sensitive material when the amount of exposure gives a density higher than fog density of side-A by 1.60. The light-sensitive material suited as a film for X-ray photography and gives an image having excellent sharpness and graininess.

Abstract: Disclosed is a method for processing a silver halide photographic light-sensitive material using a roller transport automatic processing machine having a developing tank containing a developing solution, a fixing tank containing a fixing solution, a washing tank containing a washing solution and a drying means, comprising the steps of:developing the silver halide photographic light-sensitive material,fixing the developed material,washing the fixed material, anddrying the washed material,wherein said method is carried out under the following condition:9.0.ltoreq.H.sub.D.sup.0.75 .times.T.ltoreq.21.0, H.sub.D =H.sub.1 +H.sub.2, H.sub.1 .ltoreq.H.sub.2,wherein H.sub.D represents transport line length, in meters, of the material entry point into the developer solution to the material entry point into the washing solution, H.sub.1 represents transport line length, in meters, of the material entry point into the developer solution to the material entry point into the fixing solution, H.sub.

Abstract: Disclosed is a light-sensitive silver halide photographic material comprising a support having a first face and a second face, a first photographic component layer being provided on the first face and a second photographic component layer being provided on the second face, each of the first and second component layer comprising a silver halide emulsion layer, wherein; when an exposure dose at a position on the first face is an exposure dose giving a density of a fog density +1.60 after exposing from the first face side and developing the material, a density at a position on the second face corresponding to the position on the first face is fog +0.20 or less, and an amount of a light which transmitted through the first component layer and the support and reaching an interface between the support and the second component layer is 12 to 75% of a light to which the first face side of the material is exposed.