Patents by Inventor Haruhiro Kobayashi

Haruhiro Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6346023
    Abstract: A method is herein disclosed for preparing a film of a carbon nano-tube to obtain a low cost field emission source using a carbon nano-tube. A single-wall carbon nano-tube is placed together with acetone in a beaker, to which ultrasonic wave is applied to disperse the single-wall carbon nano-tube in acetone. Thereafter, acetone is evaporated spontaneously to deposit the single-wall carbon nano-tube on a copper plate placed in the beaker. The copper plate on the surface of which the single-wall carbon nano-tube is deposited is used for a cathode of an electronic tube.
    Type: Grant
    Filed: August 24, 1999
    Date of Patent: February 12, 2002
    Assignee: Futaba Denshi Kogyo Kabushiki Kaisha
    Inventors: Toshiyuki Tsuboi, Kenji Nawamaki, Haruhiro Kobayashi
  • Patent number: 6149775
    Abstract: There is provided a method for preparing a single layer carbon nano-tube stably and in high preparation efficiency. Helium is introduced from a gas inlet 19 while exhausting inside a vacuum chamber 11 by means of a rotary pump 12 to prepare an atmosphere of rare gas. DC arc discharge is established between a metal-added carbon electrode to which a single metal is added 13 and a metal-added carbon electrode to which a single metal the kind of which is different from that of the former metal is added 14 by the use of a discharge power source apparatus 17. Carbon and metals are evaporated from both electrodes, and the metals are alloyed to act as a catalyst to the carbon and the single layer carbon nano-tube is prepared.
    Type: Grant
    Filed: March 9, 1999
    Date of Patent: November 21, 2000
    Assignee: Futaba Denshi Kogyo Kabushiki Kaisha
    Inventors: Toshiyuki Tsuboi, Haruhiro Kobayashi, Kenji Nawamaki
  • Patent number: 4405436
    Abstract: In a sputtering apparatus of the type wherein a cathode including a target made of ferromagnetic material and a substrate to be sputtered are disposed in an evacuated vessel in a spaced opposing relationship so as to sputter the target with ions to form thin magnetic films on said substrate, there are provided a magnet disposed on a backing plate, a shield covering surfaces of the magnet facing the substrate, the shield being made of the same or similar material as the target, and a metal block disposed to surround the magnet in contact with the shield and the backing plate. A passage for passing cooling water to cool the above components is further provided in the cathode.
    Type: Grant
    Filed: November 4, 1982
    Date of Patent: September 20, 1983
    Assignee: Anelva Corporation
    Inventors: Haruhiro Kobayashi, Hidefumi Funaki, Takehiro Sakurai