Patents by Inventor Haruhito Ono

Haruhito Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6335127
    Abstract: This invention provides a charged beam projection mask, a charged beam exposure apparatus, and the like which prevent variations in exposure dose and a positional error of a pattern projected on a wafer, thereby improving a pattern precision. In the charged beam mask, strut portions separating mask pattern regions constituting a stripe in one direction have a width larger than the width of a beam on the mask.
    Type: Grant
    Filed: June 25, 1999
    Date of Patent: January 1, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventor: Haruhito Ono
  • Publication number: 20010054690
    Abstract: This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrodes arranged along the paths of a plurality of charged-particle beams. Each of the plurality of electrodes has a membrane in which a plurality of apertures are formed on the paths of the plurality of charged-particle beams, and a support portion which supports the membrane. At least two of the plurality of electrodes are arranged to form a nested structure.
    Type: Application
    Filed: March 29, 2001
    Publication date: December 27, 2001
    Inventors: Yasuhiro Shimada, Takayuki Yagi, Haruhito Ono
  • Publication number: 20010052576
    Abstract: This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrode structures which are arranged along the paths of a plurality of charged-particle beams and have pluralities of apertures on the paths of the plurality of charged-particle beams. At least one of the plurality of electrode structures includes a substrate having a plurality of apertures for transmitting the plurality of charged-particle beams, and a plurality of electrodes extending from the side surfaces of the plurality of apertures to the peripheries of the plurality of apertures. At least the surface of the substrate is insulated.
    Type: Application
    Filed: March 29, 2001
    Publication date: December 20, 2001
    Inventors: Yasuhiro Shimada, Takayuki Yagi, Haruhito Ono, Hiroshi Maehara
  • Patent number: 6157137
    Abstract: A multi-electron beam source comprises an electron emitting element part including: a plurality of electron emitting elements provided two-dimensionally in a matrix-like arrangement on a substrate; opposing terminals of electron emitting elements arranged adjacently in the column direction thereof being electrically connected to each other; terminals on the same side of all the electron emitting elements in the same row being electrically connected; and the plurality of electron emitting elements being arranged in "m" rows, "m" representing a number of two or more, and a driving circuit part for driving said electron emitting element part. The multi-electron beam source has means for removing a spike noise superposed onto the driving pulse generated by said driving cirucit part.
    Type: Grant
    Filed: October 22, 1997
    Date of Patent: December 5, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidetoshi Suzuki, Ichiro Nomura, Tetsuya Kaneko, Haruhito Ono
  • Patent number: 6011567
    Abstract: An image forming apparatus having a plurality of electron emitting devices and luminescent members are arranged into a matrix formed on one surface of a substrate. As rows of electron emitting devices are successively driven, each luminescent member emits light according to a voltage applied to it or other members in accordance with an image information signal when irradiated with a light beam from one of the electron emitting devices mated with it.
    Type: Grant
    Filed: February 14, 1995
    Date of Patent: January 4, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Naoto Nakamura, Ichiro Nomura, Hidetoshi Suzuki, Tetsuya Kaneko, Haruhito Ono, Toshihiko Takeda, Shinya Mishina
  • Patent number: 6005333
    Abstract: An electron beam generating device has at least one electron emitting element and at least one modulation electrode on a substrate. The modulation electrode may be provided on the same or reverse side of the substrate as or to the side bearing the electron emitting element. The electron emitting element is constituted of a lower potential electrode, a higher potential electrode and an electron emitting portion between the electrodes. The lower potential electrode has a different dimension than the higher potential electrode, or the substrate region bearing the electron emitting element has a different thickness than the other region, depending on the type of arrangement of the electron emitting element and the modulation electrode.
    Type: Grant
    Filed: May 5, 1993
    Date of Patent: December 21, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsuya Kaneko, Ichiro Nomura, Hidetoshi Suzuki, Yoshikazu Banno, Haruhito Ono, Shinya Mishina
  • Patent number: 5757123
    Abstract: An electron-beam generator comprises an electron-emitting device and a modulating electrode capable of modulating an electron beam emitted from the electron-emitting device in response to an information signal. The modulating electrode and the electron-emitting device are laminated so as to interpose an insulating substrate therebetween.
    Type: Grant
    Filed: September 14, 1994
    Date of Patent: May 26, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ichiro Nomura, Toshihiko Takeda, Yoshikazu Banno, Tetsuya Kaneko, Haruhito Ono, Hidetoshi Suzuki
  • Patent number: 5682085
    Abstract: A multi-electron beam source comprises an electron emitting element part including: a plurality of electron emitting elements provided two-dimensionally in a matrix-like arrangement on a substrate; opposing terminals of electron emitting elements arranged adjacently in the column direction thereof being electrically connected to each other; terminals on the same side of all the electron emitting elements in the same row being electrically connected; and the plurality of electron emitting elements being arranged in "m" rows, "m" representing a number of two or more, and a driving circuit part for driving said electron emitting element part. The multi-electron beam source has means for removing a spike noise superposed onto the driving pulse generated by said driving circuit part.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: October 28, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidetoshi Suzuki, Ichiro Nomura, Tetsuya Kaneko, Haruhito Ono
  • Patent number: 5627436
    Abstract: A multi-electron beam source comprising an electron-emitting element part includes: a plurality of electron-emitting elements provided two-dimensionally in a matrix-like arrangement on a substrate, with opposing terminals of the electron-emitting elements arranged adjacently in the column direction thereof being electrically connected to each other, terminals on the same side of all the electron-emitting elements in the same row being electrically connected, and the plurality of electron-emitting elements being arranged in "m" rows, "m" representing a number of two or more. In addition, a driving circuit drives the electron-emitting element part, grid electrodes modulate electron beams emitted from the electron-emitting elements, and a cut-off circuit cuts off the electron beams caused by spike noises superposed on driving pulse generated by the driving circuit part.
    Type: Grant
    Filed: August 22, 1995
    Date of Patent: May 6, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidetoshi Suzuki, Ichiro Nomura, Tetsuya Kaneko, Haruhito Ono
  • Patent number: 5233196
    Abstract: An electron beam apparatus for applying an electron beam from an electron source onto a target plane is characterized by comprising one sheet of electrode disposed between said electron source for emitting the electron beam in parallel or substantially parallel and a target arrangement position, and a power source for supplying a desired voltage to said electrode.
    Type: Grant
    Filed: September 24, 1991
    Date of Patent: August 3, 1993
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiko Okunuki, Haruhito Ono
  • Patent number: 5185554
    Abstract: An electron-beam generator includes an electron-emitting device and a modulating electrode capable of modulating an electron beam emitted from the electron-emitting device in response to an information signal. The modulating electrode and the electron-emitting device are laminated so as to interpose an insulating substrate therebetween.
    Type: Grant
    Filed: March 21, 1990
    Date of Patent: February 9, 1993
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ichiro Nomura, Toshihiko Takeda, Yoshikazu Banno, Tetsuya Kaneko, Haruhito Ono, Hidetoshi Suzuki
  • Patent number: 5138402
    Abstract: A semiconductor electron emitting device comprising a Schottky electrode and a p type semiconductor. The Schottky electrode is disposed on the p type semiconductor and defines a junction formed therebetween. The p type semiconductor has an impurity concentration within a predetermined range adapted for causing an avalanche breakdown responsive to a reverse biasing voltage applied between said p type semiconductor and said Schottky electrode. Electrons are emitted from the Schottky electrode in response to the application of the reverse bias voltage.
    Type: Grant
    Filed: December 13, 1991
    Date of Patent: August 11, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takeo Tsukamoto, Toshihiko Takeda, Haruhito Ono, Nobuo Watanabe, Masahiko Okunuki
  • Patent number: 4999083
    Abstract: A fine working method of a crystalline material comprises forming an ion injection region in a crystalline material by irradiating a focused ion beam on a crystalline material and subsequently removing a predetermined region of the ion injection region by applying a chemical etching treatment. The method includes performing ion injection where no removal of the predetermined region occurs even if the crystalline material is exposed to an etchant. The predetermined region is removed by injecting an etchant into the ion injection region.
    Type: Grant
    Filed: October 2, 1989
    Date of Patent: March 12, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuo Watanabe, Takeo Tsukamoto, Toshihiko Takeda, Haruhito Ono, Masahiko Okunuki
  • Patent number: 4956578
    Abstract: A surface conduction electron-emitting device includes a high-potential electrode provided on a substrate surface, an electron-emitting region provided in contact with the periphery of an exposed part of the high-potential electrode, and a low-potential electrode in contact with the periphery of the electron-emitting region. The low-potential electrode may project upward in the thickness direction of the substrate to a higher level than the high-potential electrode. A device for applying a voltage may further provided between the high-potential electrode and low-potential electrode. The low-potential electrode may be divided into plural numbers and potential may be applied to each of the low-potential electrodes independently.
    Type: Grant
    Filed: July 27, 1988
    Date of Patent: September 11, 1990
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akira Shimizu, Hidetoshi Suzuki, Masahiko Okunuki, Haruhito Ono, Ichiro Nomura, Yoshikazu Banno, Toshihiko Takeda, Tetsuya Kaneko