Patents by Inventor Harukazu Shimizu

Harukazu Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7762209
    Abstract: The plasma processing apparatus M2 has a first and a second elongate electrodes 30, 30. A processing gas is introduced from a first aperture 30b formed between upper first edges of the electrodes 30, 30 into a gap 30a between the electrodes 30, 30. An electric field is applied and a plasma is generated between the electrodes 30, 30. The processing gas is blown-off from the gap 30a through a second aperture 30c formed between lower second edges of the electrodes 30, 30. A first side surface on the first edge of the first electrode 30 is covered by an insulative cover 22 including a cover main body 22A and a plasma-proof member 26 which is formed of an insulative material which is higher in plasma-proof property than the cover main body 22A. The plasma-proof member 26 forms a processing gas introducing hole which is continuous with the first aperture 30b. The plasma-proof member 26 is contacted with the first side surface.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: July 27, 2010
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Satoshi Mayumi, Mamoru Hino, Susumu Yashiro, Harukazu Shimizu
  • Publication number: 20080128089
    Abstract: The plasma processing apparatus M2 has a first and a second elongate electrodes 30, 30. A processing gas is introduced from a first aperture formed between upper first edges of the electrodes 30, 30 into a gap 30a between the electrodes 30, 30. An electric field is applied and a plasma is generated between the electrodes 30, 30. The processing gas is blown-off from the gap 30a through a second aperture formed between lower second edges of the electrodes 30, 30. An insulative spacer 60 is disposed in the gap 30a so as to be interposed between the electrodes 30, 30 substantially at an intermediate section in the longitudinal direction of the electrodes 30, 30. The spacer 60 prevents the electrodes 30, 30 from being deformed to narrow the gap 30a between the electrodes 30, 30 due to the Coulomb force, etc.
    Type: Application
    Filed: November 27, 2007
    Publication date: June 5, 2008
    Applicant: Sekisui Chemical Co., Ltd.
    Inventors: Satoshi Mayumi, Mamoru Hino, Susumu Yashiro, Harukazu Shimizu
  • Publication number: 20080131336
    Abstract: A plasma processing apparatus M1 is provided with a processing part 20 for supporting a pair of elongate electrodes 30. The processing part 20 is provided with a plurality of pull bolts 52 (approach-deforming preventers) mutually spacedly arranged in the longitudinal direction of the electrode 30. A head part of each pull bolt 52 is hooked on a rigid plate 33 through a bolt holder 53, and a leg part thereof is screwed in the electrode 30. Owing to this arrangement, the electrodes 30 can be prevented from being deformed by Coulomb's force.
    Type: Application
    Filed: November 28, 2007
    Publication date: June 5, 2008
    Applicant: Sekisui Chemical Co., Ltd.
    Inventors: Satoshi Mayumi, Mamoru Hino, Susumu Yashiro, Harukazu Shimizu
  • Patent number: 7322313
    Abstract: A plasma processing apparatus M1 is provided with a processing part 20 for supporting a pair of elongate electrodes 30. The processing part 20 is provided with a plurality of pull bolts 52 (approach-deforming preventers) mutually spacedly arranged in the longitudinal direction of the electrode 30. A head part of each pull bolt 52 is hooked on a rigid plate 33 through a bolt holder 53, and a leg part thereof is screwed in the electrode 30. Owing to this arrangement, the electrodes 30 can be prevented from being deformed by Coulomb's force.
    Type: Grant
    Filed: August 28, 2003
    Date of Patent: January 29, 2008
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Satoshi Mayumi, Mamoru Hino, Susumu Yashiro, Harukazu Shimizu
  • Publication number: 20050161317
    Abstract: A plasma processing apparatus M1 is provided with a processing part 20 for supporting a pair of elongate electrodes 30. The processing part 20 is provided with a plurality of pull bolts 52 (approach-deforming preventers) mutually spacedly arranged in the longitudinal direction of the electrode 30. A head part of each pull bolt 52 is hooked on a rigid plate 33 through a bolt holder 53, and a leg part thereof is screwed in the electrode 30. Owing to this arrangement, the electrodes 30 can be prevented from being deformed by Coulomb's force.
    Type: Application
    Filed: August 28, 2003
    Publication date: July 28, 2005
    Inventors: Satoshi Mayumi, Mamoru Hino, Susumu Yashiro, Harukazu Shimizu
  • Patent number: 5344245
    Abstract: A serial printer comprises a printing head, a carrier for carrying the printing head, a platen, and a pair of guide members extending in parallel with the platen for supporting the carrier in a movable manner. An openable member is attached openably to the casing of the printer and supporting one of the guide members. Engaging receivers are formed in the carrier for allowing the one guide member to engage therewith and disengage therefrom in a direction substantially perpendicular to the extending direction of the one guide member. Engaging brackets may be mounted on the printing head for coming into and out of engagement with one of the guide members at a right angle with respect to the extending direction of the one guide member. Moving members may be supported movably in the casing of the printer for supporting the one guide member, when moved, to bring the one guide member into and out of an engagement with the engaging brackets.
    Type: Grant
    Filed: July 13, 1992
    Date of Patent: September 6, 1994
    Assignee: Seikosha Co., Ltd.
    Inventors: Akio Tajima, Hiroyuki Harada, Harukazu Shimizu, Haruo Inoue, Takashi Kougo, Hajime Oda, Tadashi Nakagawa, Tsuyoshi Hayakawa