Abstract: A model generating method performed by a computer is provided. First, multiple models are generated by repeatedly executing genetic programming that receives a training data set as an input, and for each of the multiple models, a fitness value that represents a degree of conformity between a corresponding model of the multiple models and the training data set is generated. Next, an indicator is calculated for each of the multiple models, and the multiple models are classified into clusters, by using the indicator calculated for each of the multiple models. Next, a cluster to which the largest number of the models belong is selected from the clusters. Finally, from among models belonging to the selected cluster, a model with the greatest fitness value is selected.

Abstract: An abnormality detecting unit includes a monitoring unit for monitoring an operation from a wafer deviation starting point to a transfer gate valve opening point after performing a plasma process on the wafer and specifying the operation as a wafer deviation operation; an acquisition unit for acquiring a high frequency signal of at least one of a progressive wave and a reflection wave outputted from a directional coupler between a high frequency power supply for applying a high frequency power into a processing chamber and a matching unit or between a lower electrode as a mounting table for mounting thereon the wafer and the matching unit during the wafer deviation operation; an analysis unit for analyzing a waveform pattern of the high frequency signal; and an abnormality determination unit for determining whether there is an abnormal electric discharge based on an analysis result of the waveform pattern.