Patents by Inventor Harumi Hayakawa

Harumi Hayakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9134617
    Abstract: A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: September 15, 2015
    Assignees: TOKYO OHKA KOGYO CO., LTD., RIKEN
    Inventors: Takahiro Senzaki, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
  • Patent number: 9060415
    Abstract: A method for producing a substrate having a surface nanostructure, including a forming, on a substrate, a layer containing a block copolymer having a plurality of blocks bonded together, and subsequently heating this layer to cause phase separation of the layer; a decomposing at least a portion of the phase including at least one block of the plurality of blocks that constitute the block copolymer of this layer; and immersing the layer in a developing solution and selectively removing the phase containing the decomposed block(s), the developing solution containing, as the main component, an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2 and a vapor pressure at 25° C. that is less than 2.1 kPa, or benzene which may be substituted with an alkyl group, an alkoxy group or a halogen atom.
    Type: Grant
    Filed: February 15, 2012
    Date of Patent: June 16, 2015
    Assignees: Riken, Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Shigenori Fujikawa, Harumi Hayakawa, Takahiro Senzaki, Ken Miyagi
  • Patent number: 8999631
    Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: April 7, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
  • Patent number: 8961802
    Abstract: A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2, and having vapor pressure of less than 2.1 kPa at 25° C., or is benzene that may be substituted by an alkyl group, an alkoxy group, or a halogen atom, and the developing solution further contains metal alkoxide.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: February 24, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Shigenori Fujikawa, Harumi Hayakawa, Takahiro Senzaki, Ken Miyagi
  • Patent number: 8956810
    Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: February 17, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
  • Publication number: 20140127626
    Abstract: A negative tone-development resist composition for forming a guide pattern, including a base component (A) and an acid generator component (B), the base component (A) including a resin component (A1) having a structural unit (a1) derived from an acrylate ester containing an acid dissociable group, and at least one of the following structural units (a2): a structural unit derived from an acrylic acid ester containing a lactone-containing cyclic group, a structural unit derived from an acrylic acid ester containing an ether-containing cyclic group and a structural unit derived from an acrylic acid ester containing a carbonate-containing cyclic group, and a constituent unit (a1) derived from an acrylic acid ester containing an acid-labile group, the acid generator component (B) including an acid generator (B1) including at least one compound represented by general formula (b1) or (b2) shown below
    Type: Application
    Filed: October 5, 2011
    Publication date: May 8, 2014
    Applicants: RIKEN, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
  • Publication number: 20140113236
    Abstract: A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure.
    Type: Application
    Filed: June 8, 2012
    Publication date: April 24, 2014
    Applicants: Riken, Tokyo Ohka Kogyo Co., Ltd
    Inventors: Takahiro Senzaki, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
  • Publication number: 20140054265
    Abstract: A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2, and having vapor pressure of less than 2.1 kPa at 25° C., or is benzene that may be substituted by an alkyl group, an alkoxy group, or a halogen atom, and the developing solution further contains metal alkoxide.
    Type: Application
    Filed: June 26, 2013
    Publication date: February 27, 2014
    Applicants: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Shigenori Fujikawa, Harumi Hayakawa, Takahiro Senzaki, Ken Miyagi
  • Publication number: 20140030652
    Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
    Type: Application
    Filed: September 12, 2011
    Publication date: January 30, 2014
    Applicants: Riken, Tokyo Ohka Kogyo Co.,Ltd.
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
  • Publication number: 20130313223
    Abstract: A method for producing a substrate having a surface nanostructure, including a forming, on a substrate, a layer containing a block copolymer having a plurality of blocks bonded together, and subsequently heating this layer to cause phase separation of the layer; a decomposing at least a portion of the phase including at least one block of the plurality of blocks that constitute the block copolymer of this layer; and immersing the layer in a developing solution and selectively removing the phase containing the decomposed block(s), the developing solution containing, as the main component, an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2 and a vapor pressure at 25° C. that is less than 2.1 kPa, or benzene which may be substituted with an alkyl group, an alkoxy group or a halogen atom.
    Type: Application
    Filed: February 15, 2012
    Publication date: November 28, 2013
    Applicants: TOKYO OHKA KOGYO CO., LTD., RIKEN
    Inventors: Shigenori Fujikawa, Harumi Hayakawa, Takahiro Senzaki, Ken Miyagi