Abstract: A method for printing a periodic pattern of linear features into a photosensitive layer which includes providing a mask bearing a pattern of linear features, arranging the substrate parallel to the mask, generating an elongated beam for illuminating the mask with a range of angles of incidence in a plane parallel to the linear features and with a uniform power per incremental distance along the length of the beam except at its ends where the power per incremental distance falls to zero according to first and second profiles over a fall-off distance, and scanning the beam in first and second sub-exposures to print first and second parts of the desired pattern such that the first and second parts overlap by the fall-off distance. The first and second profiles are selected so that their summation across the fall-off distance produces a uniform power per incremental distance.

Abstract: A method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist includes: providing a first mask bearing a high-resolution grating of linear features, arranging the first mask at a first distance from a substrate, providing a second mask bearing a variable-transmission grating of opaque and transparent linear features that has a designed spatial variation of duty cycle, arranging the second mask at a distance before the first mask such that the linear features of the variable-transmission grating are orthogonal to the linear features of the high-resolution grating, illuminating the second mask while varying the first distance according to displacement Talbot lithography and also displacing the second mask at an angle to its linear features such that there is substantially no component of modulation with the period of the variable-transmission grating in the energy density distribution that exposes the photoresist.

Abstract: A method for printing a periodic pattern of linear features into a photosensitive layer which includes providing a mask bearing a pattern of linear features, arranging the substrate parallel to the mask, generating an elongated beam for illuminating the mask with a range of angles of incidence in a plane parallel to the linear features and with a uniform power per incremental distance along the length of the beam except at its ends where the power per incremental distance falls to zero according to first and second profiles over a fall-off distance, and scanning the beam in first and second sub-exposures to print first and second parts of the desired pattern such that the first and second parts overlap by the fall-off distance. The first and second profiles are selected so that their summation across the fall-off distance produces a uniform power per incremental distance.

Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

Abstract: A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a periodic pattern, providing a substrate bearing the photosensitive layer, and arranging the substrate substantially parallel to the mask. A beam of collimated monochromatic light is formed for illuminating the mask pattern so that the light-field transmitted by the mask forms Talbot image planes separated by a Talbot distance. N sub-exposures of the mask with the beam are performed and the separation between sub-exposures are changed so that the relative separation during the ith sub-exposure with respect to that during the first sub-exposure is given by (mi+ni/N) times the Talbot distance. The mask pattern is exposed to the same energy density of illumination for each sub-exposure, wherein the period is selected in relation to the wavelength so that only the zeroth and first diffraction orders are transmitted by the mask.

Abstract: A method for printing a desired periodic pattern includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with the light while varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes. The layer is exposed to a time-integrated intensity distribution that prints the desired pattern. The separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.

Abstract: A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a periodic pattern, providing a substrate bearing the photosensitive layer, and arranging the substrate substantially parallel to the mask. A beam of collimated monochromatic light is formed for illuminating the mask pattern so that the light-field transmitted by the mask forms Talbot image planes separated by a Talbot distance. N sub-exposures of the mask with the beam are performed and the separation between sub-exposures are changed so that the relative separation during the ith sub-exposure with respect to that during the first sub-exposure is given by (mi+ni/N) times the Talbot distance. The mask pattern is exposed to the same energy density of illumination for each sub-exposure, wherein the period is selected in relation to the wavelength so that only the zeroth and first diffraction orders are transmitted by the mask.

Abstract: A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

Abstract: A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a mask pattern, providing a substrate bearing the layer, arranging the substrate parallel to the mask, providing a number of lasers having a plurality of peak wavelengths, forming from the light a beam for illuminating the mask with a spectral distribution of exposure dose and a degree of collimation, illuminating the mask with the beam such that the light of each wavelength transmitted by the mask pattern forms a range of transversal intensity distributions between Talbot planes and exposes the photosensitive layer to an image component. The separation and the spectral distribution are arranged so that the superposition of the components is equivalent to an average of the range of transversal intensity distributions formed by light of one wavelength and the collimation is arranged so that the features are resolved.

Abstract: A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.

Abstract: A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

Abstract: A method for printing a desired periodic pattern includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with the light while varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes. The layer is exposed to a time-integrated intensity distribution that prints the desired pattern. The separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.

Abstract: A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.

Abstract: The present invention is directed to a method for the generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. The method includes the steps of generating a number of diffraction masks such that each mask comprises at least one transmission diffraction gratings having at least one of a different periodic concentric circular pattern, spiral-like periodic pattern and periodic radial spoke pattern; positioning at least one of the diffraction masks simultaneously or successively in a certain distance of the basic support material to be patterned, the distance being mask dependent; exposing the basic support material by directing light beams through each of the diffraction masks; and interfering the different light beams diffracted by the gratings on each mask in order to generate coincident light intensity patterns on the surface of the basic support material.

Abstract: It is the aim of the invention to provide a technology for the stimulation of the crystallization of biomolecules contained in a liquid solution that leads to significant improvements in the reliability of crystal growth processes and shortens the time and the number of attempts to grow a certain biomolecule crystal, also under the condition that only very small amounts of the biomolecules are available.

Abstract: It is the aim of the invention to provide a technology for the stimulation of the crystallization of biomolecules contained in a liquid solution that leads to significant improvements in the reliability of crystall growth processes and shortens the time and the number of attempts to grow a certain biomolecule crystal, also under the condition that only very small amounts of the biomolecules are available.

Abstract: According to the present invention a method for grafting a chemical compound to a predetermined region of a support substrate (4) is disclosed, comprising: a) irradiating selectively the support substrate with electromagnetic radiation and/or particle radiation in order to both define said predetermined region and to form at least one reactive functional group or a precursor thereof in said predetermined region of the support substrate; b) exposing the irradiated support substrate to said chemical compound or to a precursor thereof. Therefore, only these very few steps are needed to effectively grafting the desired chemical compound, such as an organic compound, to the predetermined regions of the support substrate. Moreover, the irradiation step can be carried out in a vastly flexible manner and allows to generate numerous distinct shapes of the predetermined regions.

Abstract: The present invention is directed to a method for the generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. The method includes the steps of generating a number of diffraction masks such that each mask comprises at least one transmission diffraction gratings having at least one of a different periodic concentric circular pattern, spiral-like periodic pattern and periodic radial spoke pattern; positioning at least one of the diffraction masks simultaneously or successively in a certain distance of the basic support material to be patterned, the distance being mask dependent; exposing the basic support material by directing light beams through each of the diffraction masks; and interfering the different light beams diffracted by the gratings on each mask in order to generate coincident light intensity patterns on the surface of the basic support material.

Abstract: Sensing of microfluidic flow is carried out by confining and directing a fluid along a surface in a primary direction of flow past a cantilever beam which is mounted at one end of the beam to the surface. The cantilever beam has opposite beam surfaces that are oriented at an angle off parallel to the primary direction of flow of the fluid. As the fluid is directed past the beam at a rate such that the drag forces imposed by the fluid on the opposite surfaces of the beam are greater than the inertial forces of the fluid on the beam, a differential force is applied to the beam that tends to pivot the beam about its mount to the surface or bend the beam or both. The deflection of the beam in response to the differential drag forces may be detected to determine the rate of flow of the fluid.