Abstract: A solid electrolyte material has a pair of surfaces which face each other and includes at least one of a predetermined halide-based solid electrolyte or a predetermined sulfide-based solid electrolyte, in which a surface ten-point average roughness RzJIS of at least one of the pair of surfaces falls in the range from 20 nm or more and 1500 nm or less.

Abstract: An etching method includes: providing, in a chamber, a substrate including a structure including a first film selected from a molybdenum film and a tungsten film; performing a first etching on the first film by supplying an oxidation gas and a first gas selected from a MoF6 gas and a WF6 gas into the chamber; when a pore present inside the first film is exposed by the first etching, filling the pore with one of molybdenum and tungsten by stopping the first etching and supplying a reduction gas and a second gas selected the MoF6 gas and the WF6 gas into the chamber; and performing a second etching on a filling layer formed in the filling and the first film by supplying the oxidation gas and a third gas selected from the MoF6 gas and the WF6 gas into the chamber.

Abstract: An etching method includes: providing, within a chamber, a substrate that includes at least a silicon-containing material and a molybdenum film or a tungsten film which is in an exposed state, and selectively etching the molybdenum film or the tungsten film relative to the silicon-containing material by supplying, into the chamber, an oxidation gas and a hexafluoride gas as an etching gas.

Abstract: A multi-agent type hair treatment agent comprising a first composition containing component (A) and component (B); and a second composition containing component (C), wherein the weight ratio (H)/(C) of component (H) to component (C) in the second composition is less than 1. A hair treatment method comprising the steps of applying and rinsing the first composition to hair (i) and then applying the second composition to hair (ii). Component (A): a carboxylic acid having an inorganic value of 230 or more and 450 or less and an organic value of 50 or more and 250 or less, or a salt of the carboxylic acid Component (B): anionic surfactant Component (C): an aromatic sulfonic acid having a molecular weight of 300 or less or a salt thereof Component (H): cationic surfactant.

Abstract: An etching method includes preparing a substrate in which titanium nitride and molybdenum or tungsten are present, and etching the titanium nitride by supplying a processing gas including a ClF3 gas and a N2 gas to the substrate, wherein in the etching the titanium nitride, a partial pressure ratio of the ClF3 gas to the N2 gas in the processing gas is set to a value at which grain boundaries of the molybdenum or the tungsten are nitrided to such an extent that generation of a pitting is suppressed.

Abstract: An etching method includes: providing, in a chamber, a substrate including a structure including a first film selected from a molybdenum film and a tungsten film; performing a first etching on the first film by supplying an oxidation gas and a first gas selected from a MoF6 gas and a WF6 gas into the chamber; when a pore present inside the first film is exposed by the first etching, filling the pore with one of molybdenum and tungsten by stopping the first etching and supplying a reduction gas and a second gas selected the MoF6 gas and the WF6 gas into the chamber; and performing a second etching on a filling layer formed in the filling and the first film by supplying the oxidation gas and a third gas selected from the MoF6 gas and the WF6 gas into the chamber.

Abstract: A multi-agent type hair treatment agent comprising a first composition containing component (A) and component (B); and a second composition containing component (C), wherein the weight ratio (H)/(C) of component (H) to component (C) in the second composition is less than 1. A hair treatment method comprising the steps of applying and rinsing the first composition to hair (i) and then applying the second composition to hair (ii).