Patents by Inventor Haruo Nakase

Haruo Nakase has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Clean room and method for fabricating semiconductor device
    Patent number: 6616526
    Abstract: The clean room of this invention includes a first clean region in which a semiconductor substrate to be set in a fabrication system is disposed and a second clean region adjacent to the first clean region in which an operator is disposed. A first air flow flowing downward is introduced into the first clean region and a second air flow flowing downward is introduced into the second clean region. The rate of the first air flow is higher than the rate of the second air flow.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: September 9, 2003
    Assignee: Matsushita Electric Industrial Co., LTD
    Inventors: Takahiro Matsuura, Haruo Nakase
  • Clean room and method for fabricating semiconductor device
    Publication number: 20020081962
    Abstract: The clean room of this invention includes a first clean region in which a semiconductor substrate to be set in a fabrication system is disposed and a second clean region adjacent to the first clean region in which an operator is disposed. A first air flow flowing downward is introduced into the first clean region and a second air flow flowing downward is introduced into the second clean region. The rate of the first air flow is higher than the rate of the second air flow.
    Type: Application
    Filed: December 6, 2001
    Publication date: June 27, 2002
    Inventors: Takahiro Matsuura, Haruo Nakase