Patents by Inventor Haruo Yoda
Haruo Yoda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140043941Abstract: The present invention employs an object information acquiring apparatus comprising a plurality of receiving elements which receive acoustic waves emitted from an object and convert the acoustic waves into received signals, a delay unit which matches phases of the received signals, a complex converter which converts the received signals into complex signals, a complex covariance matrix calculator which periodically obtains a complex covariance matrix by using a complex signal group configured from a plurality of phase-matched complex signals, an eliminator which eliminates the number of bits of input data configured from at least either the complex signal group or matrix elements, and an electric power calculator which calculates a power of target positions, wherein the eliminator eliminates the number of bits by performing common level conversion processing on all input data relating to one complex covariance matrix.Type: ApplicationFiled: April 26, 2012Publication date: February 13, 2014Applicant: CANON KABUSHIKI KAISHAInventor: Haruo Yoda
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Publication number: 20130308850Abstract: There is used an object information acquiring apparatus including a probe for electrically scanning an object in first direction and mechanically scanning in second direction intersecting with the first direction, a first delay-and-sum unit for operating a delay-and-sum on a received signal, a memory for storing a first delay-and-sum signal for each plane in the second direction, a selecting unit for selecting signals corresponding to M sectional planes from among the stored signals, a second delay-and-sum unit for operating a delay-and-sum on the selected signals in the second direction, and a unit for acquiring image in the object from the second delay-and-sum signal, the second delay-and-sum unit switching, according to the mechanical scanning, a first case in which M signals are fixed and a delay pattern is varied and a second case in which a set of the M signals is varied and the delay pattern is fixed.Type: ApplicationFiled: January 31, 2012Publication date: November 21, 2013Applicant: CANON KABUSHIKI KAISHAInventors: Katsuya Oikawa, Haruo Yoda
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Publication number: 20120314534Abstract: An acoustic wave imaging apparatus having: a phase aligning unit which aligns phases of received signals obtained by a plurality of acoustic wave receiving elements; a complex signal acquiring unit which generates complex signals out of the phase aligned received signals; a correlation matrix calculating unit which calculates a correlation matrix of the complex signals; and an electric power calculating unit which calculates constrained minimum power of the received signals, using the correlation matrix and a predetermined constraint vector, wherein the correlation matrix calculating unit calculates the correlation matrix at a predetermined cycle, and sequentially outputs the calculated correlation matrix to the electric power calculating unit at a predetermined cycle, and the electric power calculating unit calculates a plurality of constrained minimum powers in parallel using the calculated correlation matrices, the plurality of constrained minimum powers are corresponding to the correlation matrices respecType: ApplicationFiled: March 28, 2011Publication date: December 13, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Haruo Yoda, Kenichi Nagae
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Publication number: 20120302864Abstract: A subject information acquisition apparatus includes an electromechanical conversion element which receives an elastic wave generated by irradiating with an electromagnetic wave an object in a subject and converts the received elastic wave into an electric signal; a moving device moves the electromechanical conversion element; a signal processing device calculates an image value based on the electric signal. The moving device moves the electromechanical conversion element from a first position to a second position, the electromechanical conversion element receives the elastic wave at the first position and converts the received elastic wave into a first electric signal, and receives the elastic wave at the second position and converts the received elastic wave into a second electric signal; when the electromechanical conversion element is situated at the second position, the signal processing device calculates a first image value at a specified position inside the subject based on the first electric signal.Type: ApplicationFiled: August 9, 2012Publication date: November 29, 2012Applicant: CANON KABUSHIKI KAISHAInventor: Haruo Yoda
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Publication number: 20120281902Abstract: The present invention enables ultrasonic propagation time values after correction of refraction to be calculated in parallel for each receive channel, by using a recurrence relation in the depth direction. Moreover, accumulation of errors can be avoided by using an accurate propagation time value obtained in advance at a reference depth to correct the propagation time value each time the reference depth is reached. For this error correction, the recurrence relation to calculate the propagation time value can be an approximate expression. For example, the propagation time value can be calculated using the inclination of reference propagation time values between reference depths. In an actual circuit, received signals are sequentially stored in a memory, and a receive beam is formed by calculating an address position corresponding to the propagation time value of the ultrasonic wave, and adding the received signals stored in the calculated addresses.Type: ApplicationFiled: February 22, 2011Publication date: November 8, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Katsuya Oikawa, Haruo Yoda
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Publication number: 20120257472Abstract: Generally, as the time for mechanical scanning of an acoustic wave receiver increases, the load on an examinee also increases. The present invention provides the calculation of a target speed at which an acoustic wave receiver is caused to move for the measurement of an acoustic wave, using data of an emission period of pulsed light and data of an interval between target measurement positions in a subject being examined. In addition, the acoustic wave receiver is caused to move so as to reach an initial target measurement position at the target speed at a time when initial pulsed light for measuring an acoustic wave is emitted. After the target speed has been reached, the acoustic wave receiver is caused to move at a uniform speed which is equal to the target speed.Type: ApplicationFiled: December 10, 2010Publication date: October 11, 2012Applicant: CANON KABUSHIKI KAISHAInventor: Haruo Yoda
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Publication number: 20120044785Abstract: Provided is a measuring apparatus, including: a moving mechanism for moving a probe in an elevation direction; a first delay and sum circuit for performing delay and sum of reception signals at individual positions along the elevation direction to output a first add signal; a signal extraction circuit for letting an output of the first delay and sum circuit to pass through delay circuits to output in parallel first add signals obtained at different positions; a second delay and sum circuit for performing delay and sum of the first add signals output from the signal extraction circuit to output a second add signal; and an image processing circuit for generating image data by using the second add signal. Accordingly, image resolution in the elevation direction may be improved with a simple structure without deteriorating an image obtaining speed in the measuring apparatus for obtaining an ultrasonic image.Type: ApplicationFiled: April 28, 2010Publication date: February 23, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Haruo Yoda, Katsuya Oikawa, Kenichi Nagae
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Publication number: 20110210248Abstract: A method for estimation of a probe shape, in a scanning electron microscope provided with an aberration corrector, and the method is designed so as to obtain a probe image, by inputting to a computer an image taken in a just-focused state and an image taken in a de-focused state, as an image data; preparing a correlation window by automatically determining a size of a correlation window image, based on an input data size and an output data size; executing cross-correlation calculation between the correlation window and a reference area; and repeating this calculation while shifting the reference area, so as to obtain a cross-correlation matrix, in order to stably obtain the probe image, without receiving effects of use conditions or noises.Type: ApplicationFiled: February 25, 2011Publication date: September 1, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kotoko HIROSE, Takeshi KAWASAKI, Haruo YODA, Tomonori NAKANO
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Patent number: 8008622Abstract: High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.Type: GrantFiled: December 3, 2009Date of Patent: August 30, 2011Assignees: Hitachi High-Technologies Corporation, Canon Inc.Inventors: Ryo Fujita, Haruo Yoda, Kimiaki Ando, Yuji Inoue, Masato Muraki
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Publication number: 20110128816Abstract: There is provided a received data processing apparatus of photoacoustic tomography including a minimum constitution unit data composition unit that sequentially reads receiving digital signals from first storage units and composes minimum constitution unit data of the acoustic wave of the minimum constitution units by performing a delay-and-sum process; a second storage unit that stores the minimum constitution unit data of the entire region of the specimen; an image construction unit that constructs an image of the specimen based on the minimum constitution unit data stored in the second storage unit; and a control unit that sequentially stores the minimum constitution unit data calculated by the minimum constitution unit data composition unit in the second storage unit and reads the stored minimum constitution unit data of the entire region of the specimen to transmit the minimum constitution unit data to the image construction unit.Type: ApplicationFiled: September 3, 2009Publication date: June 2, 2011Applicant: Canon Kabushiki KaishaInventors: Yoshitaka Baba, Haruo Yoda, Kazuhiko Fukutani
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Patent number: 7952074Abstract: A circuit pattern inspection method and an apparatus therefore, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined changed state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.Type: GrantFiled: August 12, 2008Date of Patent: May 31, 2011Assignee: Hitachi, Ltd.Inventors: Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda, Yutaka Kaneko, Maki Tanaka, Shunji Maeda, Hitoshi Kubota, Aritoshi Sugimoto, Katsuya Sugiyama, Atsuko Takafuji, Yusuke Yajima, Hiroshi Tooyama, Tadao Ino, Takashi Hiroi, Kazushi Yoshimura, Yasutsugu Usami
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Publication number: 20110098550Abstract: A bioinformation acquisition apparatus to input a signal having uniform sensitivity and a high SN ratio at a high speed is provided. It includes a moving device moving an element group into the arrangement direction of the elements, and moves the element group situated at a first position at first time point to be situated at a second position at second time point. The element group receives an elastic wave emitted from a test object at the first time point at the first position, and the elastic wave from the test object at the second time point at the second position. The electric signal of a specified position of a test body from a first element of the elastic waves received at the first time point and the electric signal of the specified position from a second element received at the second time point are added to each other.Type: ApplicationFiled: June 11, 2009Publication date: April 28, 2011Applicant: CANON KABUSHIKI KAISHAInventor: Haruo Yoda
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Patent number: 7915582Abstract: A method for estimation of a probe shape, in a scanning electron microscope provided with an aberration corrector, and the method is designed so as to obtain a probe image, by inputting to a computer an image taken in a just-focused state and an image taken in a de-focused state, as an image data; preparing a correlation window by automatically determining a size of a correlation window image, based on an input data size and an output data size; executing cross-correlation calculation between the correlation window and a reference area; and repeating this calculation while shifting the reference area, so as to obtain a cross-correlation matrix, in order to stably obtain the probe image, without receiving effects of use conditions or noises.Type: GrantFiled: December 18, 2007Date of Patent: March 29, 2011Assignee: Hitachi High-Technologies CorporationInventors: Kotoko Hirose, Takeshi Kawasaki, Haruo Yoda, Tomonori Nakano
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Publication number: 20100264309Abstract: A method for estimation of a probe shape, in a scanning electron microscope provided with an aberration corrector, and the method is designed so as to obtain a probe image, by inputting to a computer an image taken in a just-focused state and an image taken in a de-focused state, as an image data; preparing a correlation window by automatically determining a size of a correlation window image, based on an input data size and an output data size; executing cross-correlation calculation between the correlation window and a reference area; and repeating this calculation while shifting the reference area, so as to obtain a cross-correlation matrix, in order to stably obtain the probe image, without receiving effects of use conditions or noises.Type: ApplicationFiled: December 18, 2007Publication date: October 21, 2010Inventors: Kotoko HIROSE, Takeshi Kawasaki, Haruo Yoda, Tomonori Nakano
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Patent number: 7692166Abstract: An exposure apparatus which draws a pattern on a substrate with a charged particle beam is disclosed. The exposure apparatus includes a detector which detects a charged particle beam, a deflector which deflects the charged particle beam to scan the substrate or the detector with the charged particle beam, and a controller which controls the deflector to scan each of a plurality of scanning ranges on the detector with the charged particle beam, and calculates, on the basis of the charged particle beam amount detected by the detector upon scanning the plurality of scanning ranges, the intensity distribution of the charged particle beam which strikes the detector.Type: GrantFiled: June 13, 2007Date of Patent: April 6, 2010Assignee: Canon Kabushiki KaishaInventors: Masato Muraki, Haruo Yoda
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Publication number: 20100078555Abstract: High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.Type: ApplicationFiled: December 3, 2009Publication date: April 1, 2010Inventors: Ryo FUJITA, Haruo Yoda, Kimiaki Ando, Yuji Inoue, Masato Muraki
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Publication number: 20100078556Abstract: High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.Type: ApplicationFiled: December 3, 2009Publication date: April 1, 2010Inventors: Ryo Fujita, Haruo Yoda, Kimiaki Ando, Yuji Inoue, Masato Muraki
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Patent number: 7642514Abstract: It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.Type: GrantFiled: December 27, 2007Date of Patent: January 5, 2010Assignee: Hitachi, Ltd.Inventors: Atsushi Takane, Haruo Yoda, Hideo Todokoro, Fumio Mizuno, Shoji Yoshida, Mitsuji Ikeda, Mitsugu Sato, Makoto Ezumi
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Patent number: 7635851Abstract: High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.Type: GrantFiled: September 13, 2006Date of Patent: December 22, 2009Assignees: Hitachi High-Technologies Corporation, Canon Inc.Inventors: Ryo Fujita, Haruo Yoda, Kimiaki Ando, Yuji Inoue, Masato Muraki
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Patent number: 7608844Abstract: In the present invention, vector data developing unit, ends separating unit, overlap removing unit and bitmapped data generating unit are sequentially connected in order to make pipeline processing. In addition, data of each raster is orderly arranged as a unit so that each processor can process data of each raster at a time. Each processor can make the pipeline processing to fast generate data. In addition, small-scale circuits can be used to realize the system because each raster can be processed as a unit of processing. Moreover, since data is orderly arranged before being processed, multi-valued bitmapped data can be generated in the order of drawing. Therefore, the drawing operation and data generating operation can be performed in parallel without use of any large-scale storage device.Type: GrantFiled: May 25, 2005Date of Patent: October 27, 2009Assignees: Hitachi High-Technologies Corporation, Canon Inc.Inventors: Yuji Inoue, Haruo Yoda, Kimiaki Ando, Yoshikiyo Yui