Abstract: The ?-ketoimine ligand is represented by the following formula 1: wherein R1 and R2 are each independently a C1-C5 alkyl group. A metal complex compound includes the ?-ketoimine ligand. A method of forming the ?-ketoimine ligand and a method of forming a thin film using the metal complex compound including ?-ketoimine ligand are provided.

Abstract: The ?-ketoimine ligand is represented by the following formula 1: wherein R1 and R2 are each independently a C1-C5 alkyl group. A metal complex compound includes the ?-ketoimine ligand. A method of forming the ?-ketoimine ligand and a method of forming a thin film using the metal complex compound including ?-ketoimine ligand are provided.

Abstract: The ?-ketoimine ligand is represented by the following formula 1: wherein R1 and R2 are each independently a C1-C5 alkyl group. A metal complex compound includes the ?-ketoimine ligand. A method of forming the ?-ketoimine ligand and a method of forming a thin film using the metal complex compound including ?-ketoimine ligand are provided.

Abstract: When an optical element is produced using a liquid crystal film having no supporting substrate film for the purpose of decreasing the weight, the liquid crystal film layer may often pose problems of fine wrinkly deformation of and cracking in a caused by strain occurring during a manufacturing/processing step. The present invention intends to provide an elliptical polarizer having a thinned optical anisotropic element which is free from such deformation and cracking. The elliptical polarizer of the present invention comprises at least a polarizer and an optical anisotropic element wherein said optical anisotropic element comprises a liquid crystalline substance layer with a fixed liquid crystal orientation, a tacky adhesive/adhesive layer, and a stress blocking layer.

Abstract: When an optical element is produced using a liquid crystal film having no supporting substrate film for the purpose of decreasing the weight, the liquid crystal film layer may often pose problems of fine wrinkly deformation of and cracking in a caused by strain occurring during a manufacturing/processing step. The present invention intends to provide an elliptical polarizer having a thinned optical anisotropic element which is free from such deformation and cracking. The elliptical polarizer of the present invention comprises at least a polarizer and an optical anisotropic element wherein said optical anisotropic element comprises a liquid crystalline substance layer with a fixed liquid crystal orientation, a tacky adhesive/adhesive layer, and a stress blocking layer.

Abstract: A light-shielding layer including a light-shielding material containing a grafted carbon material, light-shielding material being electrodeposited to form the light-shielding layer, a method for producing a light-shielding layer including a step of electrodepositing a coating material containing a grafted carbon material on a electrode, and a method for producing a substrate having a light-shielding layer including the steps of (1) forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, (2) exposing a predetermined area of the photosensitive coating film to light, (3) removing and developing the photosensitive coating film for exposing the transparent electrically conductive layer, and electrodepositing a coating material containing a grafted carbon material on the exposed transparent electrically conductive layer for forming the light-shielding layer, and (4) heating said substrate thus obtained.

Abstract: A thermosetting composition containing a carbonaceous material (1-1) and a thermosetting resin (1-2), the carbonaceous material (1-1) being obtained by reacting by contacting a carbon material (a) with a polymer (b) having in the molecule thereof at least one particular reactive group such as aziridine group, oxazoline group, N-hydroxyalkylamido group, epoxy group, or hydroxyl group, and an alkoxycarbonyl group represented by the formulaR.sup.1 R.sup.2 R.sup.3 C--O--CO-- (1)wherein each of R.sup.1, R.sup.2, and R.sup.3 stands for a hydrogen atom or an organic residue selected from an alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 5 to 8 carbon atoms, an alkylcycloalkyl group having 6 to 16 carbon atoms, or an aryl group having 6 to 16 carbon atoms, wherein at least two of R.sup.1, R.sup.2, and R.sup.

Abstract: A method for producing a carbonaceous material including the step of contacting a carbon material with a polymer having in the molecule thereof one or more reactive group(s) selected from aziridine group, oxazoline group, N-hydroxyalkylamido group, epoxy group, thioepoxy group, isocyanato group, hydroxyl group, amino group, vinyl group, acryl group or methacryl group, and an alkoxycarbonyl group represented by the formula (I)R.sup.1 R.sup.2 R.sup.3 C--O--CO-- (I)wherein R.sup.1, R.sup.2 and R.sup.3 are the same or different groups and denote a hydrogen atom, or a specific organic residue.

Abstract: A method for producing a black pigment including the step of contacting a polymer (1) containing 5 to 500 mmol of hydroxyl groups, and optionally 30 to 300 mmol of carboxyl groups per 100 g of the polymer with a carbon material (2) at a temperature of 50 to 250.degree. C. The obtained black pigment can be dispersed in a dispersion media at a high density, can be used for producing a black-hued ink, a black-hued electrodeposition coating material, a thermosetting black-hued coating material, a photocuring black-hued coating material, and a photocuring black-hued electrodeposition coating material, and is useful as a material for a black matrix of a color filter or a counterelectrode substrate for black and white display TFT array substrate.

Abstract: A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

Abstract: A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.multidot.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

Abstract: A method for producing a color filter comprising exposing a portion of the color filter corresponding to colored portions through a different pattern mask by colors and in an irradiation dose varying for each mask to effect patterning and successively coloring the pattern portions smaller or larger in the order of light irradiation dose by way of development and electrodeposition.

Abstract: A positive type photoresist composition contains (a) 100 parts by weight of a resin which is a polymer compound (A) including carbon-carbon double bonds and having a molecular weight of 300 to 30,000 and an iodine value of to 500. To at least a part of the double bonds of the polymer compound (A), a group represented by the formula (I) is introduced ##STR1## wherein R.sup.1 denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and R.sup.2 denotes an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or an aryl group, The composition further contains (b) 25 to 100 parts by weight of a compound containing a quinone diazide unit.

Abstract: A method for producing a color filter involves (A) forming a photosensitive coating film on at least a transparent electrically conductive layer formed on an outermost surface of a transparent substrate and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film region corresponding to one of the patterns of the smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon. Operation of developing and removing the photosensitive coating film and electrodepositing the colored coating is repeated for the respective patterns of different degrees of light transmittances in sequence of difference in light transmittances to form different colored layers.

Abstract: A method for producing a color filter involves the steps of: (A) forming a photosensitive coating film on an electrically conductive layer formed on a surface of a substrate, and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the electrically conductive layer, and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon; (C) repeating the step (B) for the respective patterns of different degrees of light transmittances in sequence of difference in transmittances for producing different colored layers, respectively; and (D) transcribing the colored layers onto another substrate.

Abstract: A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer of a transparent substrate having the transparent electrically conductive layer on its surface, and exposing the photosensitive coating film to light in a first irradiation amount through a mask having a predetermined pattern of a certain light transmittance and at least once displacing the mask to another position on the photosensitive coating film and exposing the photosensitive coating film to light in a second irradiation amount different from the first irradiation amount through the mask; and (B) developing and removing a photosensitive coating film portion exposed to light in one of the smallest and largest irradiation amounts for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating fi

Abstract: A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer provided on an outermost surface of a substrate having an alignment film, and exposing the photosensitive coating film to light in a first irradiation amount through a mask having a predetermined pattern of a certain light transmittance and at least once displacing the mask to another position on the photosensitive coating film and exposing the photosensitive coating film to light in a second irradiation amount different from the first irradiation amount through the mask; (B) developing and removing a photosensitive coating film portion exposed to light in one of smallest and largest irradiation amounts for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the c

Abstract: A method for producing a color filter involves (A) forming a photosensitive coating film on an electrically conductive layer formed on a surface of a substrate, and exposing the photosensitive coating film trough a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the electrically conductive layer and electrodepositing a colord coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film followed by electrodeposition being repeated for the respective patterns of different degrees of light transmittances in sequence of difference in transmittances for producing different colored layers, respectively; (C) selectively forming a metal layer in interstices present between the colored layers, and (D) transcribing the c

Abstract: A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer formed on a surface of a transparent substrate and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film region registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being repeated for the respective patterns of different degrees of light transmittances in sequence of difference in light transmittances to form different colored layers, respectively; and (C) selectively forming a metal layer on at least on

Abstract: A method for producing a color filter involves the steps of: (A) forming a photosensitive coating film on a transparent electrically conductive layer formed on a surface of a transparent substrate, and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer, and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon; and (C) repeating the step (B) for the respective patterns of different degrees of light transmittances in sequence of difference in transmittances for producing different colored layers, respectively.