Abstract: A process for creating and applying a soft, high-definition, complex shaped appliqué such that the shape of the appliqué is not distorted when stitched onto a garment and the appliqué can optionally be embroidered without requiring additional alignment processes. The appliqués are made by sublimating a high-definition image onto an upper fabric capable of retaining the high-definition image, affixing the upper fabric to a soft backing fabric capable of resisting dimensional distortion, and then laser cutting the complex shape such that the resulting appliqué can be stitched onto a garment.

Abstract: The invention provides high definition litho appliqué and emblems manufactured from appropriate fabric, such as 100% polyester twill or micro fiber material, which has been sublimated with a high definition photograph-quality print. The high definition litho appliqué and emblems are cut into the desired shape and optional affixed to a garment. The invention further provides processes for producing the same.