Abstract: A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical element having a numeric aperture in a range of from 0.65 to 1.25, inclusive.

Abstract: A refractive index grating comprising an optical fiber having at least one radiation-sensitized portion, in a longitudinal section of the optical fiber, containing a periodic variation of refractive index. The refractive index grating has an initial magnitude that changes no more than two percent after conditioning at a temperature of 300° C. for a time of ten minutes.

Abstract: Method of fabricating an optical element. A photodefinable composition is provided that includes (i) a hydrophobic, photodefinable polymer, said photodefinable polymer having a glass transition temperature in the cured state of at least about 80° C.; and (ii) a multiphoton photoinitiator system comprising at least one multiphoton photosensitizer and preferably at least one phtoinitiator that is capable of being photosensitized by the photosensitizer. One or more portions of the composition are imagewise exposed to the electromagnetic energy under conditions effective to photodefinably form at least a portion of a three-dimensional optical element.

Abstract: Method of fabricating an optical element. A photodefinable composition is provided that includes (i) a hydrophobic, photodefinable polymer, said photodefinable polymer having a glass transition temperature in the cured state of at least about 80° C.; and (ii) a multiphoton photoinitiator system comprising at least one multiphoton photosensitizer and preferably at least one phtoinitiator that is capable of being photosensitized by the phtosensitizer. One or more portions of the composition are imagewise exposed to the electromagnetic energy under conditions effective to photodefinably form at least a portion of a three-dimensional optical element.

Abstract: A refractive index grating comprising an optical fiber having at least one radiation-sensitized portion, in a longitudinal section of the optical fiber, containing a periodic variation of refractive index. The refractive index grating has an initial magnitude that changes no more than two percent after conditioning at a temperature of 300° C. for a time of ten minutes.

Abstract: A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical element having a numeric aperture in a range of from 0.65 to 1.25, inclusive.

Abstract: A method for making a structure including applying a multiphoton-curable composition to a molded article, wherein the composition comprises a curable species and a multiphoton photoinitiator system, and at least partially curing the multiphoton-curable composition to form a structure on the article.

Abstract: An improved method is disclosed for etching the thick field insulator films of silicon-oxy-nitride, during the fabrication process of metal oxide semiconductor (MOS) devices, wherein a polycrystalline silicon etch mask is used in conjunction with an acid etchant to etch the gate and interconnect openings through the thick field insulator to the source, gate and chain regions of the MOS devices for a memory array.