Abstract: The object of the present invention is to provide a holographic notch filter which can favorably reject and remove a narrow, desired range of wavelengths of the incident light and a method of easily manufacturing the holographic notch filter. For achievement of the above object of the present invention, a multi-structure holographic notch filter 2 having a holographic recording material 4 arranged on which modulations of the refractive index are recorded by two-beam interference is provided as characterized in that a thin-film filter element 6 is fabricated from a thin form of the holographic recording material 4 in which modulations of the refractive index are recorded by the two-beam interference and a plurality of the thin-film filter elements 6 are joined together to develop a layer arrangement.

Abstract: The object of the present invention is to provide a holographic notch filter which can favorably reject and remove a narrow, desired range of wavelengths of the incident light and a method of easily manufacturing the holographic notch filter. For achievement of the above object of the present invention, a multi-structure holographic notch filter 2 having a holographic recording material 4 arranged on which modulations of the refractive index are recorded by two-beam interference is provided as characterized in that a thin-film filter element 6 is fabricated from a thin form of the holographic recording material 4 in which modulations of the refractive index are recorded by the two-beam interference and a plurality of the thin-film filter elements 6 are joined together to develop a layer arrangement.

Abstract: The object of the present invention is to provide a wire grid type polarizer formed of an inexpensive material in a comparatively simple process. A wire grid type polarizer of the present invention comprises: a substrate which prevents light in a specific wavelength range from being transmitted therethrough; and a photoresist layer provided on a surface and a back of the substrate, wherein parallel line patterns having a plurality of concave-convex portions are formed on the photoresist layer to be in parallel with each other on the surface and the back of the substrate, and a metal is deposited only over a top of a convex portion of the parallel line patterns having the concavo-convex portions formed on the surface and the back of the substrate and in the vicinity thereof so that a wire grid is formed on the surface and the back of the substrate.