Abstract: In one embodiment, a writing method includes calculating irradiation times for each shot of individual beams of multiple charged particle beams, setting, based on the calculated irradiation times, an ON or OFF state of each individual beam at each irradiation step in a shot cycle comprising a plurality of irradiation steps, extracting a number of beams set in the ON state at a longest irradiation step in each shot with the multiple charged particle beams, determining, based on the extracted number of beams, whether to change the shot cycle, and sequentially applying, based on the determining, the beams corresponding to the irradiation times of the plurality of irradiation steps to a substrate placed on a stage to write a pattern on the substrate, while performing tracking control such that an irradiation region irradiated with the multiple charged particle beams follows movement of the stage.

Abstract: According to one embodiment of the present invention, a mounting substrate is installed on a multi charged particle beam irradiation apparatus, and a blanking aperture array chip provided with blanking electrodes to perform blanking deflection on beams in a multi charged particle beam is mounted on the mounting substrate. The mounting substrate includes an opening through which the multi charged particle beam passes, a plurality of control circuits that supply a control signal to the blanking electrodes for each of a plurality of areas into which the blanking aperture array chip is divided, and grounds, each of which is provided for a corresponding one of the plurality of control circuits and configured to supply a ground electrical potential to the corresponding control circuit. The grounds corresponding to the control circuits are electrically separated from each other.

Abstract: Provided is a method for obtaining high-quality products safely and stably. The present invention relates to a method for producing a compound, the method including feeding a slurry containing crystals of the compound to a hydraulic wash column; melting crystals in a crystal-containing circulation slurry discharged from the hydraulic wash column; discharging a mother liquor using a filter from the crystal-containing slurry in the hydraulic wash column; and introducing a liquid having a temperature equal to or higher than the temperature of the mother liquor immediately after being discharged in the mother liquor discharging step into a nozzle attached to the hydraulic wash column from outside the hydraulic wash column, the nozzle being other than a nozzle at a return port for a circulation liquid containing a melt obtained in the melting and a pipe that feeds the crystal-containing slurry to the hydraulic wash column.

Abstract: In one embodiment, a multiple charged-particle beam writing method includes emitting multiple charged-particle beams, switching predetermined beams of the multiple charged-particle beams between on and off using a plurality of blankers provided on a blanking aperture array substrate, and transferring, while moving a stage installed in a writing chamber, control data for on-off control of each beam of the multiple charged-particle beams to a control circuit of the blanking aperture array substrate to irradiate a writing target substrate placed on the stage with the multiple charged-particle beams based on the control data and write a pattern. The control circuit is operated during a period of beam non-irradiation in which the writing target substrate is not irradiated with the multiple charged-particle beams.

Abstract: [Problem] To prevent or suppress generation of polymers in the internal space of a protrusion unit. [Solution] A handling device 100 includes a flow unit 10, a protrusion unit 30, a spray unit 40, and a grid 50. The spray unit is configured to be able to be disposed in an internal space 31 of the protrusion unit and be able to spray liquid onto the inner wall surface of the protrusion unit with the spray unit disposed in the internal space. The grid is disposed at the boundary of a flow path 11 of the flow unit and the internal space of the protrusion unit to prevent irregular packing F packed in a packed bed 17 from moving to the internal space.

Abstract: A controller supplies, during beam irradiation, a shift register with control data which causes flip-flops to hold a “1” value and has a first voltage, and supplies, during a period except for the beam irradiation, the shift register with the control data which causes the flip-flops to hold a “1” value and has a second voltage lower than the first voltage to determine whether the flip-flops are operating normally by determining whether the control data supplied to the shift register coincides with control data output from one flip-flop or by determining whether a state to be obtained by blanking by a first electrode coupled to a first flip-flop in accordance with the control data supplied to the shift register coincides with a state by blanking by the first electrode in accordance with the control data supplied to the shift register.

Abstract: A blanking aperture array system includes a data output circuit that outputs first data and a first error detection code generated from the first data. A shift register transfers the first data and first error detection code that are input from the data output circuit. A buffer receives the first data from a first register. An electrode receives a voltage based on the first data output from the buffer. An error detection circuit receives the first data and first error detection code from a register of a last stage, generates a second error detection code from the first data received from the register of the last stage, and generate a detection signal indicating a match if the first error detection code from the register of the last stage and the second error detection code match and indicating a mismatch if they do not match.

Abstract: Provided is a method for obtaining high-quality products safely and stably. The present invention relates to a method for producing a compound, the method including feeding a slurry containing crystals of the compound to a hydraulic wash column; melting crystals in a crystal-containing circulation slurry discharged from the hydraulic wash column; discharging a mother liquor using a filter from the crystal-containing slurry in the hydraulic wash column; and introducing a liquid having a temperature equal to or higher than the temperature of the mother liquor immediately after being discharged in the mother liquor discharging step into a nozzle attached to the hydraulic wash column from outside the hydraulic wash column, the nozzle being other than a nozzle at a return port for a circulation liquid containing a melt obtained in the melting and a pipe that feeds the crystal-containing slurry to the hydraulic wash column.

Abstract: According to one embodiment of the present invention, a mounting substrate is installed on a multi charged particle beam irradiation apparatus, and a blanking aperture array chip provided with blanking electrodes to perform blanking deflection on beams in a multi charged particle beam is mounted on the mounting substrate. The mounting substrate includes an opening through which the multi charged particle beam passes, a plurality of control circuits that supply a control signal to the blanking electrodes for each of a plurality of areas into which the blanking aperture array chip is divided, and grounds, each of which is provided for a corresponding one of the plurality of control circuits and configured to supply a ground electrical potential to the corresponding control circuit. The grounds corresponding to the control circuits are electrically separated from each other.

Abstract: In order to correct the rotation angle value without an increase in the circuit size, a rotation period measurement unit measures a rotation period of a rotary shaft in which a rotation angle is detected by using a resolver that outputs a signal corresponding to the rotation angle of the rotary shaft. A rotation speed calculation unit calculates the rotation speed of the rotary shaft based on the rotation period. An acceleration calculation unit calculates the rate of change of the rotation speed per interval when a given rotation angle of the rotary shaft is divided into 2n+1 intervals, in which n is an integer of 1 or more. An estimated angle calculation unit calculates the rotation angle estimation value, assuming that the rotary shaft performs a uniform acceleration motion, based on the rotation speed and the rate of change of the rotation speed. A correction value calculation unit calculates the correction value of the rotation angle value converted from the output signal of the resolver.

Abstract: In one embodiment, a data processing method is for processing data in a writing apparatus performing multiple writing by using multiple beams. The data is for controlling an irradiation amount for each beam. The method includes generating irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation position, and the plurality of layers corresponding to writing paths in multiple writing, performing a correction process on the irradiation amounts defined in the irradiation amount data provided for each layer, calculating a sum of the irradiation amounts for the respective irradiation positions defined in the corrected irradiation amount data, comparing the sums between the plurality of layers, and determining whether or not an error has occurred in the correction process based on the comparison result.

Abstract: In one embodiment, a data processing method is for processing data in a writing apparatus performing multiple writing by using multiple beams. The data is for controlling an irradiation amount for each beam. The method includes generating irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation position, and the plurality of layers corresponding to writing paths in multiple writing, performing a correction process on the irradiation amounts defined in the irradiation amount data provided for each layer, calculating a sum of the irradiation amounts for the respective irradiation positions defined in the corrected irradiation amount data, comparing the sums between the plurality of layers, and determining whether or not an error has occurred in the correction process based on the comparison result.

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a blanking plate including a plurality of blankers, bitmap generation processing circuitry generating bitmap data for each writing pass of multi-pass writing, the bitmap data specifying irradiation time periods for a plurality of irradiation positions, a plurality of dose correction units configured to receive bitmap subdata items obtained by dividing the bitmap data from the bitmap generation processing circuitry, and correct the irradiation time periods to generate a plurality of dose data items corresponding to respective processing ranges, and data transfer processing circuitry transferring the plurality of dose data items to the blanking plate through a plurality of signal line groups. Each of the signal line groups corresponds to the blankers located in a predetermined region of the blanking plate.

Abstract: A drawing device according to an embodiment includes: a stage configured to be capable of having a processing target mounted thereon; an aperture member including a plurality of apertures corresponding to a plurality of beams irradiated to the processing target; a data generator configured to generate gradation data indicating irradiation time data with n bits (n is a positive integer) with respect to positions of respective coordinates of the beams; a calculator configured to perform a logical addition operation of the gradation data of the respective positions of the coordinates; and a controller configured to control the aperture member based on the gradation data and a result of the logical addition operation.

Abstract: In order to correct the rotation angle value without an increase in the circuit size, a rotation period measurement unit measures a rotation period of a rotary shaft in which a rotation angle is detected by using a resolver that outputs a signal corresponding to the rotation angle of the rotary shaft. A rotation speed calculation unit calculates the rotation speed of the rotary shaft based on the rotation period. An acceleration calculation unit calculates the rate of change of the rotation speed per interval when a given rotation angle of the rotary shaft is divided into 2n+1 intervals, in which n is an integer of 1 or more. An estimated angle calculation unit calculates the rotation angle estimation value, assuming that the rotary shaft performs a uniform acceleration motion, based on the rotation speed and the rate of change of the rotation speed. A correction value calculation unit calculates the correction value of the rotation angle value converted from the output signal of the resolver.

Abstract: A drawing device according to an embodiment includes: a stage configured to be capable of having a processing target mounted thereon; an aperture member including a plurality of apertures corresponding to a plurality of beams irradiated to the processing target; a data generator configured to generate gradation data indicating irradiation time data with n bits (n is a positive integer) with respect to positions of respective coordinates of the beams; a calculator configured to perform a logical addition operation of the gradation data of the respective positions of the coordinates; and a controller configured to control the aperture member based on the gradation data and a result of the logical addition operation.

Abstract: Disclosed is a method of diagnosing a conversion process for converting a format of image data including unit data corresponding to charged particle beams into a format suitable for an aperture array, the aperture array having a plurality of controllers provided to match a plurality of the charged particle beams to control the charged particle beams, and a driver configured to drive the controllers. The method includes: extracting the unit data having an identical first rank based on an arrangement of the unit data in the image data from the unit data of each block including a predetermined number of the unit data and calculating a first checksum of each of the first rank; extracting the unit data having an identical second rank after the conversion process from the unit data of each block and calculating a second checksum of each of the second rank; and comparing the first and second checksums.

Abstract: According to one embodiment, in a multi-charged particle beam writing apparatus, a blanking plate includes a plurality of first buffers connected in series, second buffers in a plurality of stages connected in series between the first buffer and a blanker, and an error detection processing circuitry performing error detection on data stored in the first buffer and the second buffers. The blanking control data transfers to the corresponding blanker via the first buffer and the second buffers. In a case where the error detection processing circuitry detects an error, the control processing circuitry retransmits the blanking control data to the blanking plate with regard to a shot having the error detected therein and a shot which comes, in a shot order, after the shot having the error detected therein.

Abstract: A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a blanking plate including a plurality of blankers, bitmap generation processing circuitry generating bitmap data for each writing pass of multi-pass writing, the bitmap data specifying irradiation time periods for a plurality of irradiation positions, a plurality of dose correction units configured to receive bitmap subdata items obtained by dividing the bitmap data from the bitmap generation processing circuitry, and correct the irradiation time periods to generate a plurality of dose data items corresponding to respective processing ranges, and data transfer processing circuitry transferring the plurality of dose data items to the blanking plate through a plurality of signal line groups. Each of the signal line groups corresponds to the blankers located in a predetermined region of the blanking plate.