Patents by Inventor Hayato MURATA

Hayato MURATA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230193458
    Abstract: One object of the present invention is to provide a method for producing a metal nitride film that has a high film formation rate and excellent productivity. The present invention provides a method for producing a metal nitride film in which a metal nitride film is formed on at least a part of a surface of a substrate to be processed by chemical vapor deposition using a metal compound raw material and a nitrogen-containing compound raw material, wherein the nitrogen-containing compound raw material contains hydrazine and ammonia.
    Type: Application
    Filed: May 6, 2021
    Publication date: June 22, 2023
    Inventors: Hayato MURATA, Tadaki MIZUNO, Keisuke ANDACHI, Katsumasa SUZUKI