Patents by Inventor Hayato Nishii

Hayato Nishii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Modified polysilazane and process for preparation thereof
    Patent number: 5494978
    Abstract: A stabilized polysilazane obtained by reacting an inorganic polysilazane having a number average molecular weight of about 100 to about 100,000 with an alcohol, an organic acid, an ester, a ketone, an aldehyde, a mercaptan, or an alkysilazane preferably at a molar ratio of from 50/50 to 99.99/0.01 is described.
    Type: Grant
    Filed: November 30, 1994
    Date of Patent: February 27, 1996
    Assignee: Tonen Corporation
    Inventors: Yasuo Shimizu, Yuuji Tashiro, Hiroyuki Aoki, Masaaki Ichiyama, Hayato Nishii, Toshihide Kishi, Kouji Okuda, Takeshi Isoda
  • Polysiloxazanes, silicon oxynitride fibers and processes for producing same
    Patent number: 5166104
    Abstract: Novel polysiloxazanes comprising [SiH.sub.2).sub.n NH-- and [SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).
    Type: Grant
    Filed: September 6, 1991
    Date of Patent: November 24, 1992
    Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
  • Molded articles formed of silicon nitride based ceramic and process for producing same
    Patent number: 5145812
    Abstract: A molded body formed of a silicon nitride-based ceramic containing Si and N and optionally O, C and/or a metal. The ceramic is formed from a polysilazane. A molded body may be a composite body which is composed of a matrix of the ceramic and a reinforcing material such as powder or fiber embedded within the matrix or which is composed of ceramic powder bound with a binder formed of the silicon nitride-based ceramic.
    Type: Grant
    Filed: August 19, 1991
    Date of Patent: September 8, 1992
    Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Mikiro Arai, Osamu Funayama, Hayato Nishii, Tamio Ishiyama, Hiroshi Kaya, Takeshi Isoda, Kouichi Yasuda, Atsuro Takazawa, Tadashi Suzuki, Ichiro Kohshi, Masaaki Ichiyama, Tomohiro Kato
  • Polysiloxazanes, silicon oxynitride fibers and processes for producing same
    Patent number: 5079323
    Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH] and --SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).
    Type: Grant
    Filed: July 18, 1990
    Date of Patent: January 7, 1992
    Assignee: Toa Nenro Kogyo Kabushiki Kaisha
    Inventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
  • Polysiloxazanes, silicon oxynitride fibers and processes for producing same
    Patent number: 4965058
    Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH-- and --SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mols % or more) and oxygen (5 mol % or more).
    Type: Grant
    Filed: July 19, 1989
    Date of Patent: October 23, 1990
    Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
  • Processes for producing polysiloxazanes and silicon oxynitride fibers
    Patent number: 4869858
    Abstract: Novel polysiloxazanes comprising [(SiH.sub.2).sub.n NH] and [(SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).
    Type: Grant
    Filed: February 12, 1987
    Date of Patent: September 26, 1989
    Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
  • High-purity silicon nitride fibers
    Patent number: 4818611
    Abstract: Silicon nitride fibers having a carbon content of 5 weight percent or less have high heat insulating properties and favorable mechanical properties and are useful as heat resistant, highly insulating materials or reinforcing agents for composite materials, particularly in the aerospace industry. Such high purity silicon nitride fibers are produced by spinning a solution of perhydropolysilazanes, an inert solvent and a spinning agent into fibers, preferably continuous fibers, and firing the spun fibers at 800.degree. to 1300.degree. C. in an inert atmosphere to form silicon nitride fibers of high purity.
    Type: Grant
    Filed: November 13, 1986
    Date of Patent: April 4, 1989
    Assignee: Tao Nenryo Kogyo K.K.
    Inventors: Mikiro Arai, Osamu Funayama, Hayato Nishii, Takeshi Isoda