Patents by Inventor Hayato NISHIYAMA

Hayato NISHIYAMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220259223
    Abstract: The present invention provides a compound having Keap1 inhibitory effects and a pharmaceutical composition containing the same. Specifically, the present invention provides a compound represented by the following general formula (I): [wherein the symbols have the same meanings as those described in the description] or a pharmaceutically acceptable salt thereof and a pharmaceutical composition containing the same.
    Type: Application
    Filed: May 29, 2020
    Publication date: August 18, 2022
    Applicant: UBE INDUSTRIES, LTD.
    Inventors: Ken-ichi KOMORI, Hayato NISHIYAMA, Naoya KINOSHITA, Yukinori WADA, Kousuke MORISHITA, Akishi NINOMIYA, Yuusuke SHIRAISHI, Kazuhiro ONUMA, Sayaka OGI, Hiroyoshi KAWADA, Tomio KIMURA
  • Patent number: 10968238
    Abstract: Methods of producing a compound represented by formula (I) or a pharmacologically acceptable salt thereof include: wherein L1 is an optionally substituted C1-6 alkylene group or the like, L2 is a single bond or the like, L3 is a single bond or the like, R1, R2, and R3 are each independently an optionally substituted C1-4 alkyl group or the like, R4 is a hydrogen atom or the like, and R5 is a hydrogen atom or the like.
    Type: Grant
    Filed: October 30, 2018
    Date of Patent: April 6, 2021
    Assignee: UBE INDUSTRIES, LTD.
    Inventors: Noriaki Iwase, Shigeyuki Kono, Masayuki Tanaka, Masaaki Matoyama, Satoshi Umezaki, Yusuke Shiraishi, Masahiro Kojima, Hayato Nishiyama
  • Publication number: 20190062353
    Abstract: Methods of producing a compound represented by formula (I) or a pharmacologically acceptable salt thereof include: wherein L1 is an optionally substituted C1-6 alkylene group or the like, L2 is a single bond or the like, L3 is a single bond or the like, R1, R2, and R3 are each independently an optionally substituted C1-4 alkyl group or the like, R4 is a hydrogen atom or the like, and R5 is a hydrogen atom or the like.
    Type: Application
    Filed: October 30, 2018
    Publication date: February 28, 2019
    Applicant: UBE INDUSTRIES, LTD.
    Inventors: Noriaki IWASE, Shigeyuki KONO, Masayuki TANAKA, Masaaki MATOYAMA, Satoshi UMEZAKI, Yusuke SHIRAISHI, Masahiro KOJIMA, Hayato NISHIYAMA
  • Patent number: 10131679
    Abstract: Provided is a compound represented by formula (I) or a pharmacologically acceptable salt thereof: wherein L1 is an optionally substituted C1-6 alkylene group or the like, L2 is a single bond or the like, L3 is a single bond or the like, R1, R2, and R3 are each independently an optionally substituted C1-4 alkyl group or the like, R4 is a hydrogen atom or the like, and R5 is a hydrogen atom or the like.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: November 20, 2018
    Assignee: UBE INDUSTRIES, LTD.
    Inventors: Yasuhiro Aga, Shigeru Ushiyama, Noriaki Iwase, Shigeyuki Kono, Hidetoshi Sunamoto, Takashi Matsushita, Sayaka Ogi, Masayuki Tanaka, Masaaki Matoyama, Satoshi Umezaki, Yusuke Shiraishi, Kazuhiro Onuma, Masahiro Kojima, Hayato Nishiyama, Tomio Kimura
  • Publication number: 20170313727
    Abstract: Provided is a compound represented by formula (I) or a pharmacologically acceptable salt thereof: wherein L1 is an optionally substituted C1-6 alkylene group or the like, L2 is a single bond or the like, L3 is a single bond or the like, R1, R2, and R3 are each independently an optionally substituted C1-4 alkyl group or the like, R4 is a hydrogen atom or the like, and R5 is a hydrogen atom or the like.
    Type: Application
    Filed: October 30, 2015
    Publication date: November 2, 2017
    Applicant: UBE INDUSTRIES, LTD.
    Inventors: Yasuhiro AGA, Shigeru USHIYAMA, Noriaki IWASE, Shigeyuki KONO, Hidetoshi SUNAMOTO, Takashi MATSUSHITA, Sayaka OGI, Masayuki TANAKA, Masaaki MATOYAMA, Satoshi UMEZAKI, Yusuke SHIRAISHI, Kazuhiro ONUMA, Masahiro KOJIMA, Hayato NISHIYAMA, Tomio KIMURA