Patents by Inventor Hayato NOTOMI

Hayato NOTOMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma generating device
    Patent number: 10755898
    Abstract: A plasma generating device is an inductively coupled plasma generating device comprising an antenna coil that generates plasma in a vacuum chamber, a high-frequency power source that is connected to a reference potential to be referred for plasma potential and that applies high-frequency voltage to the antenna coil, and a resonance circuit provided between the antenna coil and the high-frequency power source. The resonance circuit comprises a first series reactance element that is connected in series to one end portion of the antenna coil and has at least a capacitance component and a second series reactance element that is connected in series to the other end portion of the antenna coil and has at least a capacitance component. The circuit configuration at one side and the circuit configuration at the other side are electrically symmetrical.
    Type: Grant
    Filed: September 18, 2019
    Date of Patent: August 25, 2020
    Assignee: DAIHEN Corporation
    Inventors: Hayato Notomi, Shigeki Amadatsu, Eiji Tatebe
  • Plasma Generating Device
    Publication number: 20200105503
    Abstract: A plasma generating device is an inductively coupled plasma generating device comprising an antenna coil that generates plasma in a vacuum chamber, a high-frequency power source that is connected to a reference potential to be referred for plasma potential and that applies high-frequency voltage to the antenna coil, and a resonance circuit provided between the antenna coil and the high-frequency power source. The resonance circuit comprises a first series reactance element that is connected in series to one end portion of the antenna coil and has at least a capacitance component and a second series reactance element that is connected in series to the other end portion of the antenna coil and has at least a capacitance component. The circuit configuration at one side and the circuit configuration at the other side are electrically symmetrical.
    Type: Application
    Filed: September 18, 2019
    Publication date: April 2, 2020
    Inventors: Hayato Notomi, Shigeki Amadatsu, Eiji Tatebe
  • Plasma generation apparatus and high-frequency power source
    Patent number: 10306744
    Abstract: A plasma generation apparatus includes a chamber, a high-frequency power source, a magnetic field generator and a parallel capacitor. The chamber has an inner, toroidal-shaped electric discharge space. The high-frequency power source outputs a high-frequency current to the magnetic field generator, which generates a high-frequency magnetic field upon flowing of the high-frequency current therethrough. The parallel capacitor is connected in parallel to the magnetic field generator.
    Type: Grant
    Filed: September 20, 2017
    Date of Patent: May 28, 2019
    Assignee: DAIHEN Corporation
    Inventors: Hayato Notomi, Shigeki Amadatsu, Eiji Tatebe, Michio Taniguchi
  • PLASMA GENERATION APPARATUS AND HIGH-FREQUENCY POWER SOURCE
    Publication number: 20180092196
    Abstract: A plasma generation apparatus includes a chamber, a high-frequency power source, a magnetic field generator and a parallel capacitor. The chamber has an inner, toroidal-shaped electric discharge space. The high-frequency power source outputs a high-frequency current to the magnetic field generator, which generates a high-frequency magnetic field upon flowing of the high-frequency current therethrough. The parallel capacitor is connected in parallel to the magnetic field generator.
    Type: Application
    Filed: September 20, 2017
    Publication date: March 29, 2018
    Inventors: Hayato NOTOMI, Shigeki AMADATSU, Eiji TATEBE, Michio TANIGUCHI