Abstract: There are provided a resist remover composition containing an amide solvent (A) represented by the following formula (1) and an organic amine compound (B), and a method for removing a resist using the resist remover composition, i.e., a resist remover composition that provides a sufficient removing capability even in a state where a resist is dissolved therein and is capable of being used for a prolonged period of time, and a method for removing a resist using the same. wherein R1 represents a linear, branched or cyclic alkyl group having from 1 to 6 carbon atoms; R2 and R3 each independently represent a linear or branched alkyl group having from 1 to 3 carbon atoms; and n represents an integer of from 0 to 2.

Abstract: There are provided a resist remover composition containing an amide solvent (A) represented by the following formula (1) and an organic amine compound (B), and a method for removing a resist using the resist remover composition, i.e., a resist remover composition that provides a sufficient removing capability even in a state where a resist is dissolved therein and is capable of being used for a prolonged period of time, and a method for removing a resist using the same. wherein R1 represents a linear, branched or cyclic alkyl group having from 1 to 6 carbon atoms; R2 and R3 each independently represent a linear or branched alkyl group having from 1 to 3 carbon atoms; and n represents an integer of from 0 to 2.