Abstract: An example operation may include one or more of receiving a message from an agent installed at a data replication server, the message comprising a status identifier of a checksum validation of a data replication operation, identifying a latency value associated with the data replication server, determining whether a data loss has occurred based on the status identifier of the checksum validation and the latency value, and in response to a determination that the data loss has occurred, transmitting a notification of the data loss to a computing system associated with the data replication server.

Abstract: A FCB stack assembly includes a PCB, a shield can, and a FCB. The shield can is fixed on the PCB for receiving and shielding electronic components on the PCB. The FCB is fixed onto and directly supported by the shield can.

Abstract: A method for providing uniformity in plasma-assisted material processes. A shielding plate is implemented within a plasma chamber above a substrate. The dimensions, geometry, and location of the shielding plate are optimized to generate a desired ion flux in a plasma-assisted material process conducted in a plasma chamber.

Abstract: An apparatus comprising a plasma chamber containing a plasma for a plasma-assisted material process upon a substrate; a shielding plate within the plasma chamber to actively direct ion flux to desired areas of the substrate; and a supporting structure to support the shielding plate within the chamber is disclosed.

Abstract: An apparatus comprising a plasma chamber containing a plasma for a plasma-assisted material process upon a substrate; a shielding plate within the plasma chamber to actively direct ion flux to desired areas of the substrate; and a supporting structure to support the shielding plate within the chamber is disclosed.

Abstract: An apparatus comprising a plasma chamber containing a plasma for a plasma-assisted material process upon a substrate; a shielding plate within the plasma chamber to actively direct ion flux to desired areas of the substrate; and a supporting structure to support the shielding plate within the chamber is disclosed.