Patents by Inventor He Long

He Long has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for providing uniformity in plasma-assisted material processes
    Patent number: 7223448
    Abstract: A method for providing uniformity in plasma-assisted material processes. A shielding plate is implemented within a plasma chamber above a substrate. The dimensions, geometry, and location of the shielding plate are optimized to generate a desired ion flux in a plasma-assisted material process conducted in a plasma chamber.
    Type: Grant
    Filed: March 24, 2003
    Date of Patent: May 29, 2007
    Assignee: Intel Corporation
    Inventors: Han-Ming Wu, He Long
  • Shielding plate in plasma for uniformity improvement
    Publication number: 20050139317
    Abstract: An apparatus comprising a plasma chamber containing a plasma for a plasma-assisted material process upon a substrate; a shielding plate within the plasma chamber to actively direct ion flux to desired areas of the substrate; and a supporting structure to support the shielding plate within the chamber is disclosed.
    Type: Application
    Filed: November 3, 2004
    Publication date: June 30, 2005
    Inventors: Han-Ming Wu, He Long
  • Shielding plate in plasma for uniformity improvement
    Publication number: 20030226503
    Abstract: An apparatus comprising a plasma chamber containing a plasma for a plasma-assisted material process upon a substrate; a shielding plate within the plasma chamber to actively direct ion flux to desired areas of the substrate; and a supporting structure to support the shielding plate within the chamber is disclosed.
    Type: Application
    Filed: March 24, 2003
    Publication date: December 11, 2003
    Inventors: Han-Ming Wu, He Long
  • Shielding plate in plasma for uniformity improvement
    Publication number: 20020142612
    Abstract: An apparatus comprising a plasma chamber containing a plasma for a plasma-assisted material process upon a substrate; a shielding plate within the plasma chamber to actively direct ion flux to desired areas of the substrate; and a supporting structure to support the shielding plate within the chamber is disclosed.
    Type: Application
    Filed: March 30, 2001
    Publication date: October 3, 2002
    Inventors: Han-Ming Wu, He Long