Patents by Inventor He-qin Li

He-qin Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8007910
    Abstract: A multilayer coating (MLC) is composed of two chemically different layered nanocrystalline materials, nanodiamond (nanoD) and nano-cubic boron nitride (nono-cBN). The structure of the MLC and fabrication sequence of layered structure are disclosed. The base layer is preferably nanoD and is the first deposited layer serving as an accommodation layer on a pretreated substrate. It can be designed with a larger thickness whereas subsequent alternate nano-cBN and nanoD layers are typically prepared with a thickness of 2 to 100 nm. The thickness of these layers can be engineered for a specific use. The deposition of the nanoD layer, by either cold or thermal plasma CVD, is preceded by diamond nucleation on a pretreated and/or precoated substrate, which has the capacity to accommodate the MLC and provides excellent adhesion.
    Type: Grant
    Filed: July 19, 2007
    Date of Patent: August 30, 2011
    Assignee: City University of Hong Kong
    Inventors: Wenjun Zhang, Shuit-Tong Lee, Igor Bello, Kar Man Leung, He-qin Li, You-Shen Zou, Yat Ming Chong, Kwok Leung Ma
  • Publication number: 20090022969
    Abstract: A multilayer coating (MLC) is composed of two chemically different layered nanocrystalline materials, nanodiamond (nanoD) and nano-cubic boron nitride (nono-cBN). The structure of the MLC and fabrication sequence of layered structure are disclosed. The base layer is preferably nanoD and is the first deposited layer serving as an accommodation layer on a pretreated substrate. It can be designed with a larger thickness whereas subsequent alternate nano-cBN and nanoD layers are typically prepared with a thickness of 2 to 100 nm. The thickness of these layers can be engineered for a specific use. The deposition of the nanoD layer, by either cold or thermal plasma CVD, is preceded by diamond nucleation on a pretreated and/or precoated substrate, which has the capacity to accommodate the MLC and provides excellent adhesion.
    Type: Application
    Filed: July 19, 2007
    Publication date: January 22, 2009
    Applicant: City University of Hong Kong
    Inventors: Wenjun Zhang, Shuit-Tong Lee, Igor Bello, Kar Man Leung, He-qin Li, You-Shen Zou, Yat Ming Chong, Kwok Leung Ma